J
J.O. Maclean
Researcher at University of Nottingham
Publications - 32
Citations - 547
J.O. Maclean is an academic researcher from University of Nottingham. The author has contributed to research in topics: Chemical beam epitaxy & Amplifier. The author has an hindex of 12, co-authored 32 publications receiving 504 citations. Previous affiliations of J.O. Maclean include Qinetiq & University of Bristol.
Papers
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Journal ArticleDOI
Time-Resolved Temperature Measurement of AlGaN/GaN Electronic Devices Using Micro-Raman Spectroscopy
Martin Kuball,Gernot Riedel,James W Pomeroy,Andrei Sarua,Michael J. Uren,Trevor P. Martin,K.P. Hilton,J.O. Maclean,David J. Wallis +8 more
TL;DR: In this article, the authors used time-resolved Raman thermography to measure transient temperatures in semiconductor devices with sub-micrometer spatial resolution, showing that the temperature changes rapidly within sub-200 ns after switching the devices on or off, followed by a slower change in device temperature.
Journal ArticleDOI
Analysis of DC–RF Dispersion in AlGaN/GaN HFETs Using RF Waveform Engineering
C. Roff,Johannes Benedikt,Paul J. Tasker,David J. Wallis,K.P. Hilton,J.O. Maclean,D.G. Hayes,Michael J. Uren,Trevor Martin +8 more
TL;DR: In this article, the authors describe how dc-radio-frequency (RF) dispersion manifests itself in AlGaN/GaN heterojunction field effect transistors when the devices are driven into different RF load impedances.
Journal ArticleDOI
Reducing Thermal Resistance of AlGaN/GaN Electronic Devices Using Novel Nucleation Layers
Gernot Riedel,James W Pomeroy,K.P. Hilton,J.O. Maclean,David J. Wallis,Michael J. Uren,Trevor Martin,Urban Forsberg,Anders Lundskog,Anelia Kakanakova-Georgieva,Galia Pozina,Erik Janzén,R. Lossy,R. Pazirandeh,Frank Brunner,Joachim Würfl,Martin Kuball +16 more
TL;DR: Using 3-D time-resolved Raman thermography, this article showed that modifying the nucleation layer (NL) used for GaN on SiC epitaxy from the metal-organic chemical vapor deposition (MOCVD)-grown standard AlN-NL to a hot-wall MOCVD-grown AlNNL reduces the thermal-boundary resistance (TBR) by 25%, resulting in a ~10% reduction of the operating temperature of AlGaN/GaN HEMTs.
Journal ArticleDOI
Nanosecond Timescale Thermal Dynamics of AlGaN/GaN Electronic Devices
Gernot Riedel,James W Pomeroy,K.P. Hilton,J.O. Maclean,David J. Wallis,Michael J. Uren,Trevor P. Martin,Martin Kuball +7 more
TL;DR: In this paper, the authors used time-resolved Raman thermography to study the thermal dynamics of AlGaN/GaN electronic devices (high-electron mobility transistors and ungated devices).
Proceedings ArticleDOI
Control of Short-Channel Effects in GaN/AlGaN HFETs
Michael J. Uren,D.G. Hayes,R.S. Balmer,David J. Wallis,K.P. Hilton,J.O. Maclean,Trevor Martin,C. Roff,P. McGovern,Johannes Benedikt,Paul J. Tasker +10 more
TL;DR: In this paper, the authors show that controlled iron doping of the GaN buffer during MOVPE growth can suppress all short-channel effects in 0.25mum gate length devices.