[신간의 별자리x] 우리/미술, 그리고 ‘슬픔의 박물관’

Conductometric semiconducting metal oxide gas sensors have been widely used and investigated in the detection of gases. Investigations have indicated that the gas sensing process is strongly related to surface reactions, so one of the important parameters of gas sensors, the sensitivity of the metal oxide based materials, will change with the factors influencing the surface reactions, such as chemical components, surface-modification and microstructures of sensing layers, temperature and humidity. In this brief review, attention will be focused on changes of sensitivity of conductometric semiconducting metal oxide gas sensors due to the five factors mentioned above.

Metal oxide gas sensors: Sensitivity and influencing factors

Transparent conductors as solar energy materials: A panoramic review

Metal oxide gas sensors are predominant solid-state gas detecting devices for domestic, commercial and industrial applications, which have many advantages such as low cost, easy production, and compact size However, the performance of such sensors is significantly influenced by the morphology and structure of sensing materials, resulting in a great obstacle for gas sensors based on bulk materials or dense films to achieve highly-sensitive properties Lots of metal oxide nanostructures have been developed to improve the gas sensing properties such as sensitivity, selectivity, response speed, and so on Here, we provide a brief overview of metal oxide nanostructures and their gas sensing properties from the aspects of particle size, morphology and doping When the particle size of metal oxide is close to or less than double thickness of the space-charge layer, the sensitivity of the sensor will increase remarkably, which would be called "small size effect", yet small size of metal oxide nanoparticles will be compactly sintered together during the film coating process which is disadvantage for gas diffusion in them In view of those reasons, nanostructures with many kinds of shapes such as porous nanotubes, porous nanospheres and so on have been investigated, that not only possessed large surface area and relatively mass reactive sites, but also formed relatively loose film structures which is an advantage for gas diffusion Besides, doping is also an effective method to decrease particle size and improve gas sensing properties Therefore, the gas sensing properties of metal oxide nanostructures assembled by nanoparticles are reviewed in this article The effect of doping is also summarized and finally the perspectives of metal oxide gas sensor are given

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Metal Oxide Nanostructures and Their Gas Sensing Properties: A Review

Aligned Single‐Crystalline Si Nanowire Arrays for Photovoltaic Applications

Chemical stoichiometry effect of hafnium oxide (HfOx) for passivation layer of PERC solar cells

Band-offset reduction for effective hole carrier collection in bifacial silicon heterojunction solar cells

Improving Retention Properties of ALD-AlxOy Charge Trapping Layer for Non-Volatile Memory Application

Application of a Gate Blocking Layer on Glass by Using TiO2 as a High-k Material for a Nonvolatile Memory

The crystallization of hydrogenated amorphous silicon (a-Si:H) is essential for improving solar cell efficiency. In this study, we analyzed the crystallization of a-Si:H via excimer laser annealing (ELA) and compared this process with conventional thermal annealing. ELA prevents thermal damage to the substrate while maintaining the melting point temperature. Here, we used xenon monochloride (XeCl), krypton fluoride (KrF), and deep ultra-violet (UV) lasers with wavelengths of 308, 248, and 266 nm, respectively. Laser energy densities and shot counts were varied during ELA for a-Si:H films between 20 and 80 nm thick. All the samples were subjected to forming gas annealing to eliminate the dangling bonds in the film. The ELA samples were compared with samples subjected to thermal annealing performed at 850–950 °C for a-Si:H films of the same thickness. The crystallinity obtained via deep UV laser annealing was similar to that obtained using conventional thermal annealing. The optimal passivation property was achieved when crystallizing a 20 nm thick a-Si:H layer using the XeCl excimer laser at an energy density of 430 mJ/cm2. Thus, deep UV laser annealing exhibits potential for the crystallization of a-Si:H films for TOPCon cell fabrication, as compared to conventional thermal annealing.

https://www.mdpi.com/1996-1073/13/13/3335/pdf

Junsin Yi

Papers

Chemical stoichiometry effect of hafnium oxide (HfOx) for passivation layer of PERC solar cells

Band-offset reduction for effective hole carrier collection in bifacial silicon heterojunction solar cells

Improving Retention Properties of ALD-AlxOy Charge Trapping Layer for Non-Volatile Memory Application

Application of a Gate Blocking Layer on Glass by Using TiO2 as a High-k Material for a Nonvolatile Memory

Crystallization of Amorphous Silicon via Excimer Laser Annealing and Evaluation of Its Passivation Properties