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Kamaruzzaman Sopian

Researcher at National University of Malaysia

Publications -  1080
Citations -  33829

Kamaruzzaman Sopian is an academic researcher from National University of Malaysia. The author has contributed to research in topics: Photovoltaic system & Solar energy. The author has an hindex of 84, co-authored 989 publications receiving 25293 citations. Previous affiliations of Kamaruzzaman Sopian include Universiti Tenaga Nasional & Universiti Putra Malaysia.

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Journal ArticleDOI

Deposition and characterization of RF-sputtered-Ta2O5 thin films for O2 reduction reaction in polymer electrolyte membrane fuel cells (PEMFC)

TL;DR: Ta2O5 thin films, proposed as the replacement of the precious Pt-based electro-catalyst in fuel cells, were sputtered on a laser textured silicon substrate at 200°C and then air annealed at 350 °C, 400‌C and 450‌°C with the aim to improve crystallinity and uniformity.
Proceedings Article

The development of a sustainably responsive ultra low energy terrace housing for the tropics incorporating the raised floor innovation

TL;DR: In this paper, the authors explore the sustainable aspects of our traditional architecture in creating a uniquely new design for in-house habitation as well as providing for an aesthetically pleasing look.
Journal ArticleDOI

The Effect of Rapid Thermal Annealing Towards the Performance of Screen-Printed Si Solar Cell

TL;DR: In this article, the thermal treatment of the annealing process of a Si solar cell was investigated and the results showed that when higher anealing temperature of the profile was used, all the parameter will increase accordingly and the profile with the highest temperature will burn the paste as it will decrease the quality of the cell.
Journal ArticleDOI

Impact of Ar Flow Rates on Micro-Structural Properties of WS2 Thin Film by RF Magnetron Sputtering.

TL;DR: In this article, the effect of Ar flow rates on the structural, morphology, and electrical properties of Tungsten disulfide (WS2) thin films was investigated thoroughly, which indicated that Ar gas flow rate is one of the important process parameters in RF magnetron sputtering that could affect the morphology, electrical properties, and structural properties of WS2 thin film.