N
N. Fasarakis
Researcher at Aristotle University of Thessaloniki
Publications - 18
Citations - 262
N. Fasarakis is an academic researcher from Aristotle University of Thessaloniki. The author has contributed to research in topics: Threshold voltage & Gate oxide. The author has an hindex of 9, co-authored 18 publications receiving 224 citations.
Papers
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Journal ArticleDOI
Compact Model of Drain Current in Short-Channel Triple-Gate FinFETs
N. Fasarakis,A. Tsormpatzoglou,D. H. Tassis,Ilias Pappas,K. A. Papathanasiou,Matthias Bucher,Gerard Ghibaudo,Charalabos A. Dimitriadis +7 more
TL;DR: An analytical drain current model for undoped (or lightly doped) short-channel triple-gate fin-shaped field effect transistors (finFETs) is presented in this article.
Journal ArticleDOI
Analytical unified threshold voltage model of short-channel FinFETs and implementation
N. Fasarakis,A. Tsormpatzoglou,D. H. Tassis,Charalabos A. Dimitriadis,K. A. Papathanasiou,J. Jomaah,Gerard Ghibaudo +6 more
TL;DR: An analytical compact model for the threshold voltage Vt of double-gate (DG) and tri-Gate (TG) FinFETs is proposed and the Vt model has been validated by developing a Verilog-A code and comparing the results derived by the Spectre simulator and the Verilogs A code with simulation results.
Journal ArticleDOI
Compact Modeling of Nanoscale Trapezoidal FinFETs
N. Fasarakis,T.A. Karatsori,A. Tsormpatzoglou,D. H. Tassis,K. A. Papathanasiou,Matthias Bucher,Gerard Ghibaudo,Charalabos A. Dimitriadis +7 more
TL;DR: In this paper, an analytical compact model for the drain current of undoped or lightly doped nanoscale FinFETs with trapezoidal cross section is proposed, and the model has been validated by comparing the results with those of 3D numerical device simulations.
Journal ArticleDOI
Analytical Modeling of Threshold Voltage and Interface Ideality Factor of Nanoscale Ultrathin Body and Buried Oxide SOI MOSFETs With Back Gate Control
N. Fasarakis,T.A. Karatsori,D. H. Tassis,Christoforos G. Theodorou,Francois Andrieu,Olivier Faynot,Gerard Ghibaudo,Charalabos A. Dimitriadis +7 more
TL;DR: In this paper, simple analytical models for the front and back gate threshold voltages and ideality factors with back gate control of lightly doped short channel fully depleted silicon-on-insulator ultrathin body and buried oxide thickness MOSFETs have been developed based on the minimum value of the back surface potentials.
Journal ArticleDOI
Origin of the low-frequency noise in n-channel FinFETs
Christoforos G. Theodorou,Christoforos G. Theodorou,N. Fasarakis,T. Hoffman,T. Chiarella,Gerard Ghibaudo,Charalabos A. Dimitriadis +6 more
TL;DR: In this article, the authors investigated the origin of low-frequency noise in n-channel fin-shaped field effect transistors (FinFETs) in terms of channel length and fin width.