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N. Fasarakis

Researcher at Aristotle University of Thessaloniki

Publications -  18
Citations -  262

N. Fasarakis is an academic researcher from Aristotle University of Thessaloniki. The author has contributed to research in topics: Threshold voltage & Gate oxide. The author has an hindex of 9, co-authored 18 publications receiving 224 citations.

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Compact Model of Drain Current in Short-Channel Triple-Gate FinFETs

TL;DR: An analytical drain current model for undoped (or lightly doped) short-channel triple-gate fin-shaped field effect transistors (finFETs) is presented in this article.
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Analytical unified threshold voltage model of short-channel FinFETs and implementation

TL;DR: An analytical compact model for the threshold voltage Vt of double-gate (DG) and tri-Gate (TG) FinFETs is proposed and the Vt model has been validated by developing a Verilog-A code and comparing the results derived by the Spectre simulator and the Verilogs A code with simulation results.
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Compact Modeling of Nanoscale Trapezoidal FinFETs

TL;DR: In this paper, an analytical compact model for the drain current of undoped or lightly doped nanoscale FinFETs with trapezoidal cross section is proposed, and the model has been validated by comparing the results with those of 3D numerical device simulations.
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Analytical Modeling of Threshold Voltage and Interface Ideality Factor of Nanoscale Ultrathin Body and Buried Oxide SOI MOSFETs With Back Gate Control

TL;DR: In this paper, simple analytical models for the front and back gate threshold voltages and ideality factors with back gate control of lightly doped short channel fully depleted silicon-on-insulator ultrathin body and buried oxide thickness MOSFETs have been developed based on the minimum value of the back surface potentials.
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Origin of the low-frequency noise in n-channel FinFETs

TL;DR: In this article, the authors investigated the origin of low-frequency noise in n-channel fin-shaped field effect transistors (FinFETs) in terms of channel length and fin width.