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Nathan Smith
Researcher at Lawrence Berkeley National Laboratory
Publications - 6
Citations - 111
Nathan Smith is an academic researcher from Lawrence Berkeley National Laboratory. The author has contributed to research in topics: Extreme ultraviolet lithography & Lithography. The author has an hindex of 4, co-authored 6 publications receiving 102 citations.
Papers
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Proceedings ArticleDOI
Critical challenges for EUV resist materials
Patrick P. Naulleau,Christopher N. Anderson,Lorie-Mae Baclea-an,Paul Denham,Simi George,Kenneth A. Goldberg,Gideon Jones,Brittany M. McClinton,Ryan Miyakawa,Seno Rekawa,Nathan Smith +10 more
TL;DR: The major issue for the 22-nm half-pitch node remains simultaneously meeting resolution, line-edge roughness (LER), and sensitivity requirements as discussed by the authors, although several materials have met the resolution requirements, LER and sensitivity remain a challenge.
Proceedings ArticleDOI
An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm
Kenneth A. Goldberg,Iacopo Mochi,Senajith Rekawa,Nathan Smith,James Macdougall,James Macdougall,Patrick P. Naulleau +6 more
TL;DR: In this paper, the authors presented the potential optical performance capabilities of a next-generation extreme ultraviolet (EUV) mask-imaging microscope, based on the proven optical principle of the SEMATECH Berkeley Actinic Inspection Tool (AIT), but substantially surpassing it in every performance metric.
Proceedings ArticleDOI
The SEMATECH Berkeley MET: extending EUV learning down to 16nm half pitch
Christopher N. Anderson,Lorie Mae Baclea-an,Paul Denham,Simi George,Kenneth A. Goldberg,Michael S. Jones,Nathan Smith,Thomas I. Wallow,Warren Montgomery,Patrick P. Naulleau +9 more
TL;DR: In this paper, five chemically amplified platforms were found to support 20-nm dense patterning at a film thickness of approximately 45 nm, but none of the resists were able to cleanly resolve a single line within a bulk pattern.
Creating an EUV mask microscope for lithography generations reaching 8 NM
Kenneth A. Goldberg,Iacopo Mochi,Markus P. Benk,Arnaud Allezy,Nathan Smith,Carl Cork,William Cork,James Macdougall,Weilun Chao,Erik H. Anderson,Patrick P. Naulleau,Eric Acome,Eric Van Every,Veljko Milanovic,Senajith Rekawa +14 more
TL;DR: SHARP as discussed by the authors is a synchrotron-based extreme ultraviolet (EUV, 13.5-nm wavelength) micro-scope to support advanced photomask research for the semiconductor industry.
Journal ArticleDOI
The Berkeley Center for Structural Biology at the Advanced Light Source
Petrus H. Zwart,J. Taylor,Simon A. Morton,Randall Cayford,Gerald V. Fontenay,Marc Allaire,Banumathi Sankaran,Jeff Dickert,Kevin Royal,Anthony Rozales,Azer Dauz,Diane Bryant,Nathan Smith,Stacey Ortega,Nicholas K. Sauter,Paul D. Adams,Corie Y. Ralston +16 more
TL;DR: The Berkeley Center for Structural Biology (BCSB) operates and develops a suite of protein crystallography beamlines at the Advanced Light Source (ALS) located at Lawrence Berkeley National Laboratory (LBNL) as mentioned in this paper.