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Nicolas Bologna

Researcher at Swiss Federal Laboratories for Materials Science and Technology

Publications -  17
Citations -  213

Nicolas Bologna is an academic researcher from Swiss Federal Laboratories for Materials Science and Technology. The author has contributed to research in topics: Nanowire & Epitaxy. The author has an hindex of 7, co-authored 17 publications receiving 181 citations. Previous affiliations of Nicolas Bologna include Polytechnic University of Milan & Masdar Institute of Science and Technology.

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High-Mobility GaSb Nanostructures Cointegrated with InAs on Si

TL;DR: A process that enables cointegration of GaSb and InAs nanostructures in close vicinity on Si, a preferred material combination ideally suited for high-performance complementary III-V metal-oxide-semiconductor technology.
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Observation of twin-free GaAs nanowire growth using template-assisted selective epitaxy

TL;DR: In this article, a template-assisted selective epitaxy (TASE) method was proposed to reduce defects due to lattice mismatch in Si-based Complementary-Metal-Oxide-Semiconductor (CMOS) technology.
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Manipulating Surface States of III–V Nanowires with Uniaxial Stress

TL;DR: Results reveal that strain technology can be used to shift surface states away from energy ranges in which device performance is negatively affected and represent a novel route to engineer the electronic properties of III-V devices.
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Ballistic one-dimensional transport in InAs nanowires monolithically integrated on silicon

TL;DR: In this paper, a monolithic integration and electrical characterization of InAs nanowires (NWs) with the well-defined geometries and positions on Si is presented as a platform for quantum transport studies.
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Dopant-Induced Modifications of GaxIn(1–x)P Nanowire-Based p–n Junctions Monolithically Integrated on Si(111)

TL;DR: The first monolithic integration of Ga xIn(1- x)P vertical nanowires, and the associated p-n junctions, on silicon by the Au-free template-assisted selective epitaxy (TASE) method is reported, demonstrating that TASE allows for a high chemical homogeneity of ternary alloys through thenanowires.