scispace - formally typeset
N

Nicolas Wyrsch

Researcher at École Polytechnique Fédérale de Lausanne

Publications -  152
Citations -  4899

Nicolas Wyrsch is an academic researcher from École Polytechnique Fédérale de Lausanne. The author has contributed to research in topics: Amorphous silicon & Silicon. The author has an hindex of 27, co-authored 140 publications receiving 4503 citations. Previous affiliations of Nicolas Wyrsch include University of Neuchâtel.

Papers
More filters
Journal ArticleDOI

Characterization of a thick layer a-Si:H pixel detector with TFA technology using a scanning electron microscope

TL;DR: In this article, the electron beam induced current (EBIC) technique was used to characterize a 32 lm thick hydrogenated amorphous silicon n-i-p diode deposited on top of an ASIC, containing several channels of active feedback pre-amplifiers with peaking time of 5 ns.
Journal ArticleDOI

Electroabsorption Spectra of Hydrogenated Amorphous and Microcrystalline Silicon

TL;DR: In this article, the electroabsorption spectra for thin films of hydrogenated silicon ranging from amorphous (a-Si:H) to micro-crystalline (micro c-Si-H) structures were reported.
Posted Content

Distributed flexibility as a cost-effective alternative to grid reinforcement.

TL;DR: In this paper, the authors evaluate the cost of providing flexibility and compare it with grid reinforcement costs and highlight that using distributed flexibility is more profitable than reinforcing a lowvoltage network until the PV generation covers 145% of the network annual energy demand.
Proceedings ArticleDOI

New Paradigm for Real-Time Measurement and Mapping in a-Si:H/μc-Si:H Tandem Devices

Abstract: Thin-film Si solar module production requires a fast wide area tool for layer characteristic measurement and control. Non-uniformity in layer deposition is expected to induce loss in module power. Simulations of amorphous Si modules using a two-dimensional model have been used to examine the efficiency loss associated with non uniformity of large scale monolithically integrated thin film modules. The results indicate that non uniform deposition significantly lowers the module efficiency, in a magnitude that varies depending on the shape and orientation of the deposition signature relative to the scribe lines. In order to control the deposition process of individual layers in layer stacks in thin-film PV modules a wide area metrology tools has been developed and tested. Example of layers maps obtained during production of Si layers module are shown. Comparisons of layer characteristics obtained using this tool and values obtained by conventional methods are given to validate the tool performances.