Rémi Vallat

TL;DR: A new heterodinuclear [Zn(L)Dy](3+) complex, with L being a compartmental Schiff base ligand, exhibits the characteristic Dy(3+) luminescence associated with a single-ion field induced slow relaxation of the magnetisation.

TL;DR: In this article, a new route for a selective deposition of thin oxide by atomic layer deposition is discussed, which is using super cycles made of an additional plasma etching step in a standard plasma enhanced atomic layer deblurring (PEALD) process.

TL;DR: In this article, a modified plasma enhanced atomic layer deposition (PEALD) sequence was developed in a modified PEALD-TiO2 sequence for bottom-up approach, where the metal oxide selectivity was obtained on TiN versus Si-based surfaces by adding one etching/passivation plasma step of fluorine every n cycles in a PEALD TiO2 process.

TL;DR: In this paper, the role of ionic species in plasma assisted chemical deposition processes is discussed in detail for commemorating the Career of John Coburn, who studied the role in plasma etching processes forty years ago, and the possibility of extracting plasma ions with a tunable incident kinetic energy driven on the substrate surface is shown to provide a valuable additional degree of freedom in plasma processing.

TL;DR: In this paper, a topographically selective deposition (PSD) process is proposed for 3D nano-structures. But the process is based on the alternate use of plasma enhanced atomic layer deposition (PEALD) and sputtering carried out in a PEALD reactor equipped with a radio-frequency substrate biasing kit.