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Wan-Ching Su
Researcher at National Sun Yat-sen University
Publications - 24
Citations - 290
Wan-Ching Su is an academic researcher from National Sun Yat-sen University. The author has contributed to research in topics: Threshold voltage & Thin-film transistor. The author has an hindex of 8, co-authored 24 publications receiving 185 citations.
Papers
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Journal ArticleDOI
Effect of mechanical-strain-induced defect generation on the performance of flexible amorphous In-Ga-Zn-O thin-film transistors
Po-Yung Liao,Ting-Chang Chang,Ting-Chang Chang,Wan-Ching Su,Yu-Jia Chen,Bo-Wei Chen,Tien-Yu Hsieh,Chung-Yi Yang,Yen-Yu Huang,Hsi-Ming Chang,Shin-Chuan Chiang +10 more
TL;DR: In this paper, the effect of mechanical strain on the performance of flexible amorphous In-Ga-Zn-O (a-InGaZnO) thin-film transistors is investigated.
Journal ArticleDOI
Flexible low-temperature polycrystalline silicon thin-film transistors
Ting-Chang Chang,Yu-Ching Tsao,Po-Hsun Chen,Po-Hsun Chen,Mao-Chou Tai,Shin Ping Huang,Wan-Ching Su,Guan Fu Chen +7 more
TL;DR: In this paper, a review of the development of the LTPS thin-film transistors (TFTs) on soft and flexible electronics, especially the effect of mechanical strain is presented.
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An Electronic Synapse Device Based on Solid Electrolyte Resistive Random Access Memory
Wei Zhang,Ying Hu,Ting-Chang Chang,Kuan-Chang Chang,Tsung-Ming Tsai,Hsin-Lu Chen,Yu-Ting Su,Tian-Jian Chu,Min-Chen Chen,Hui-Chun Huang,Wan-Ching Su,Jin-Cheng Zheng,Ya-Chi Hung,Simon M. Sze +13 more
TL;DR: In this article, the multilevel capability of solid electrolyte resistive random access memory (RRAM) with a Pt/GeSO/TiN structure was explored for potential use as a synapse device.
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Hydrogen Diffusion and Threshold Voltage Shifts in Top-Gate Amorphous InGaZnO Thin-Film Transistors
Hong-Chih Chen,Jian-Jie Chen,Kuan-Ju Zhou,Guan-Fu Chen,Chuan-Wei Kuo,Yu-Shan Shih,Wan-Ching Su,Chih-Cheng Yang,Hui-Chun Huang,Chih-Cheng Shih,Wei-Chih Lai,Ting-Chang Chang +11 more
TL;DR: In this paper, the authors introduce a TFT manufacturing process in which the source/drain system is defined by hydrogen doping in the dielectric layer of the top-gate amorphous indium gallium zinc oxide (a-IGZO).
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Ultra-Low Switching Voltage Induced by Inserting SiO 2 Layer in Indium–Tin–Oxide-Based Resistance Random Access Memory
Chih-Cheng Shih,Wen-Jen Chen,Kuan-Chang Chang,Ting-Chang Chang,Tsung-Ming Tsai,Tian-Jian Chu,Yi-Ting Tseng,Cheng-Hsien Wu,Wan-Ching Su,Min-Chen Chen,Hui-Chun Huang,Ming-Hui Wang,Jung-Hui Chen,Jin-Cheng Zheng,Simon M. Sze +14 more
TL;DR: In this paper, a lower switching voltage of an ITO-based resistance random access memory (RRAM) with an inserted SiO2 thin film was presented, where the amplitude of switching voltage was below 0.2 V whether measured by direct current or alternating current sweep operation.