Mrs Internet Journal of Nitride Semiconductor Research 

About: Mrs Internet Journal of Nitride Semiconductor Research is an academic journal. The journal publishes majorly in the area(s): Epitaxy & Photoluminescence. It has an ISSN identifier of 1092-5783. Over the lifetime, 508 publications have been published receiving 7448 citations.

The Polarity of GaN: a Critical Review

Abstract: GaN, AlN and InGaN have a polar wurtzite structure and epitaxial films of these materials typically grow along the polar axis. Although the polarity of these nitrides has been studied by quite a number of techniques, many results in the literature are in conflict. In this paper an attempt is made to lay out a set of polarity assignments to provide a context for discussion of these results. A “standard framework” is proposed to correlate the disparate results, and the framework is used to draw general conclusions about the polarity of bulk crystals, VPE and MBE epitaxial films, and devices.

A Review of Dry Etching of GaN and Related Materials

Abstract: The characteristics of dry etching of the AlGaInN materials system in different reactor types and plasma chemistries are reviewed, along with the depth and thermal stability of etch-induced damage. The application to device processing for both electronics and photonics is also discussed.

Electronic Properties of Ga(In)NAs Alloys

Abstract: A brief review on the present knowledge of the electronic properties of the Ga(In)NAs ternary and quaternary alloys is given mainly from an experimental perspective. The discussion is focused on Ga(In)NAs with low N composition (< 10 %), where a large amount of experimental work has been done. Important fundamental electronic properties of the material system are analyzed with the emphasis on the nature of the giant band gap bowing in the alloy and nitrogen-induced modifications of the electronic structure of the conduction band. The current knowledge of the key material parameters, relevant for the device applications, such as electron effective mass, recombination processes and band alignment in Ga(In)NAs/GaAs heterostructures, is also reviewed.

Suppression of phase separation in InGaN due to elastic strain

Abstract: The effect of elastic strain in epitaxial InGaN layers coherently grown on GaN wafers on spinodal decomposition of the ternary compound is examined. The effect results in considerable suppression of phase separation in the strained InGaN layers. To predict correctly the position of the miscibility gap in the T-x diagram it is important to take into account the compositional dependence of the elastic constants of the ternary compound. The contribution of the elastic strain to the Gibbs free energy of InGaN is calculated assuming uniform compression of the epitaxial layer with respect to the underlying GaN wafer. The interaction of binary constituents in the solid phase is accounted for on the base of regular solution model. The enthalpy of mixing is estimated using the Valence Force Field approximation. The strain effect becomes stronger with increasing In content in the InGaN. As a result the miscibility gap shifts remarkably into the area of higher InN concentration and becomes of asymmetrical shape. Various growth surface orientations and the type of crystalline structure (wurtzite or sphalerite) provide different effects of the elastic strain on phase separation in ternary compounds.

Review of polarity determination and control of GaN

Abstract: Polarity issues affecting III-V nitride semiconductors are reviewed with respect to their determination and control. A set of conditions crucial to the polarity control of GaN is provided for each of the following growth techniques; molecular beam epitaxy (MBE), pulsed laser deposition (PLD) and hydride vapor phase epitaxy (HVPE). Although GaN films might have been deposited by identical growth methods using the same buffer layer technologies, there is often a conflict between the resulting polarities achieved by different research groups. In this paper, we present the implications of the conditions used in each of the processes used for two-step metalorganic chemical vapor deposition (MOCVD), demonstrating systematic control of the polarity of GaN films on sapphire substrates. The potential for confusion in polarity control will be explained, taking into account the implications clarified in our studies. The correlation between the polarity and the growth conditions will be discussed in order to provide a mechanism for the determination and control of the crystal polarity during the growth of GaN films.