Proceedings ArticleDOI
Effect of sputtering power on the growth of Ru films deposited by magnetron sputtering
Prachi Jhanwar,Arvind Kumar,Seema Verma,Kamaljit Rangra +3 more
- Vol. 1724, Iss: 1, pp 020073
TLDR
In this paper, the effect of sputtering power on the electrical and structural properties of Ru films was investigated experimentally using high-resolution X-ray diffraction and atomic force microscopy (AFM).Abstract:
Ruthenium is deposited by DC magnetron sputtering at different powers and is characterized. The effect of sputtering power on the electrical and structural properties of the film is investigated experimentally. High resolution X-ray diffraction is used to characterize the microstructure of Ru films deposited on SiO2 surface. The peak (002) is more sharp and intense with full width at half maximum (FWHM) of 0.37° at 250W. The grain size increases with increase in sputtering power improving the crystallinity of the film. The film deposited at high sputtering power also showed lower resistivity (12.40 µΩ-cm) and higher mobility (4.82 cm2/V.s) as compared to the film deposited at low power. The surface morphology of the film is studied by atomic force microscopy (AFM).read more
Citations
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Journal ArticleDOI
Effect of the Sputtering Power on the Structure, Morphology and Magnetic Properties of Fe Films
TL;DR: In this paper, the radio frequency (RF) magnetron sputtering (MS) method was utilized to fabricate multiple sets of the iron film samples under different sputtering powers, and with the help of X-ray diffraction, scanning electron microscopy, atomic force microscopy (AFM) and vibrating sample magnetometer (VSM), how the sputtering power affected the structure, morphology and magnetic properties of the IR film was studied.
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Electrodeposited functionally graded coating inhibits Gram-positive and Gram-negative bacteria by a lipid peroxidation mediated membrane damage mechanism.
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Journal ArticleDOI
Microstructure Evolution of Ruthenium During Vacuum Hot Pressing : Obtaining fine-grained metal with mechanical properties close to electron-beam melted ruthenium
TL;DR: The microstructure evolution of Ru compacts with sintering time was investigated by electron backscatter diffraction (EBSD) and field emission scanning electron microscope (FSEM) as mentioned in this paper.
Journal ArticleDOI
Ru thin films prepared by RF magnetron sputtering with Ru targets of different microstructures
TL;DR: In this article , Ru targets were prepared by vacuum hot pressing with two different Ru powders with different morphologies and particle sizes, and Ru films were then deposited on SiO2/Si(100) substrates by RF magnetron sputtering at substrate temperatures ranging from room temperature (RT, about 25 °C) to 400 C.