EUV microscopy for defect inspection by dark-field mapping and zone plate zooming
Larissa Juschkin,Ralf Freiberger,Klaus Bergmann +2 more
- Vol. 186, Iss: 1, pp 012030
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TLDR
In this article, a laboratory scale EUV microscope is presented to be used, e.g., in future inspection of EUV masks and mask blanks in extreme ultraviolet lithography, where the system can be operated in bright and dark field mode.Abstract:
A laboratory scale EUV microscope is presented to be used, e.g., in future inspection of EUV masks and mask blanks in extreme ultraviolet lithography. The system can be operated in bright and dark field mode. For defect inspection purpose the dark field mode is preferred, with increased contrast and sensitivity of the system to small structures. The characteristics of the used Schwarzschild objective as imaging component such as large object field and moderate magnification become advantageous for high process speeds, whereas the detector pixel size (13 μm) does not give the spatial resolution in principle possible with the imaging optics. The presence of a defect causes a spot (with otherwise dark background) to appear on the detector. As necessary it can be zoomed in with the help of a second magnification step. For this purpose we suggest to employ a zone plate adapted to the system. The method's feasibility is demonstrated by means of experiments on test structures and the apparatus is characterized with regard to design parameters for commercial systems.read more
Citations
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Journal ArticleDOI
Sub-70 nm resolution tabletop microscopy at 13.8 nm using a compact laser–plasma EUV source
TL;DR: The first (to the authors' knowledge) demonstration of a tabletop, extreme UV (EUV) transmission microscope at 13.8 nm wavelength with a spatial (half-pitch) resolution of 69 nm with the results might be useful for the realization of a compact high-resolution tabletop imaging systems for actinic defect characterization.
Journal ArticleDOI
A 50 nm spatial resolution EUV imaging-resolution dependence on object thickness and illumination bandwidth.
TL;DR: A desk-top microscopy reaching 50 nm spatial resolution in very compact setup using a gas-puff laser plasma EUV source and the bandwidth/object thickness parasitic influence on spatial resolution of the EUV microscope is reported.
Journal ArticleDOI
Optimization of a gas discharge plasma source for extreme ultraviolet interference lithography at a wavelength of 11 nm
TL;DR: In this paper, the spectral emission characteristics of a gas discharge plasma source for high-resolution extreme ultraviolet (EUV) interference lithography based on achromatic Talbot self-imaging are optimized to achieve a required narrowband emission spectrum and to fulfill the necessary coherence and intensity requirements.
Journal ArticleDOI
Perspective: Towards single shot time-resolved microscopy using short wavelength table-top light sources.
Tobias Helk,Tobias Helk,Michael Zürch,Michael Zürch,Michael Zürch,Christian Spielmann,Christian Spielmann +6 more
TL;DR: The current state of the art techniques for full-field imaging in the extreme-ultraviolet- and soft X-ray-regime which are suitable for single exposure applications as they are paramount for studying dynamics in nanoscale systems are presented.
Journal ArticleDOI
Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research
Kenneth A. Goldberg,Iacopo Mochi +1 more
TL;DR: In this article, the authors survey the recent history of work in this area, including sixteen projects in Europe, Asia, and America, ranging from basic research and demonstration experiments to commercial inspection tool prototypes.
References
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