scispace - formally typeset
Journal ArticleDOI

Field and carrier current density profiles in linearly graded silicon avalanche diodes

R. Ghosh, +2 more
- 01 Apr 1979 - 
- Vol. 22, Iss: 4, pp 367-371
TLDR
In this article, a detailed study for the d.c. field and carrier current density profiles of linearly graded double drift avalanche diodes is presented taking into account the effect of impurity and mobile charge density and the realistic field dependance of the ionization rates and drift velocities for the charge carriers.
Abstract
A detailed study for the d.c. field and carrier current density profiles of linearly graded double drift avalanche diodes is presented taking into account the effect of impurity and mobile charge density and the realistic field dependance of the ionization rates and drift velocities for the charge carriers. The study involves finding the location and magnitude of the electric field maximum by an iterative method. A small shift in the position of the electric field maximum towards the p-side of the metallurgical junction is observed which increases with increasing current density and decreasing doping gradient. The maximum field and the depletion layer width change sharply with doping gradient but very slightly with d.c. current density. Over a larger fraction of the depletion layer, hole current density exceeds electron current density and hole dominance increases with decreasing doping gradient. The avalanche centre where Jp = Jn is found to be always on the n-side of the junction.

read more

References
More filters
Journal ArticleDOI

Ionization Rates of Holes and Electrons in Silicon

TL;DR: In this article, the ionization rates of charge carriers in silicon have been measured and fit to the recent theoretical calculations of Baraff; in contrast, none of the existing published data could fit to these theoretical curves.
Journal ArticleDOI

Design considerations of high-efficiency double-drift silicon IMPATT diodes

TL;DR: In this paper, high efficiency silicon double-drift IMPATT diodes with a low-high-low doping profile structure are proposed, with efficiencies of 25 percent for 12 GHz, 24 percent for 18 GHz, and 19 percent for 50 GHz.
Related Papers (5)