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Journal ArticleDOI

H1NMR ina-Si

W. E. Carlos, +1 more
- 01 Oct 1982 - 
- Vol. 26, Iss: 7, pp 3605-3616
TLDR
In this paper, the origins of the two NMR lines seen in almost all samples of $a$-Si: H are discussed and solid-echo measurements are presented which indicate that these two components are due to spatially isolated groups of protons.
Abstract
Results of pulsed NMR studies of hydrogen in $a$-Si: H prepared at several laboratories by glow discharge of silane are presented. The origins of the two $^{1}\mathrm{H}$ NMR lines seen in almost all samples of $a$-Si: H are discussed. Solid-echo measurements are presented which indicate that these two components are due to spatially isolated groups of protons. We attribute the narrow line to protons slightly clustered in the bulk of the material and the broad line to protons distributed on internal surfaces. The spin-lattice relaxation time shows a minimum at $T\ensuremath{\approx}30$ K which is interpreted as due to relaxation via spin diffusion to a small number of ${\mathrm{H}}_{2}$ molecules acting as relaxation centers. Annealing results suggest that all the hydrogen molecules are trapped in very similar sites.

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Citations
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Journal ArticleDOI

Vacancies and voids in hydrogenated amorphous silicon

TL;DR: In this article, the authors studied the hydride configurations in the hydrogenated amorphous silicon (a-Si:H) network by means of infrared absorption spectroscopy.
Journal ArticleDOI

Structural, optical, and spin properties of hydrogenated amorphous silicon-germanium alloys

TL;DR: In this paper, the structural and electronic properties of hydrogenated amorphous silicon-germanium alloys deposited by rf glow discharge from SiH4 and GeH4 in a diode reactor were investigated.
Journal ArticleDOI

Dielectric function of a-Si:H based on local network structures

TL;DR: For hydrogenated amorphous silicon (Si:H) layers prepared by plasma-enhanced chemical vapor deposition, the authors in this article found clear relationships between the dielectric function in the ultraviolet/visible region and SiH${}_{n}$ ($n$ $=$ 1--2) local bonding states by applying real-time spectroscopic ellipsometry and infrared attenuated total reflection spectroscopy.
Journal ArticleDOI

Si–H bonding in low hydrogen content amorphous silicon films as probed by infrared spectroscopy and x-ray diffraction

TL;DR: In this article, a series of hydrogenated amorphous silicon (a-Si:H films) has been deposited by the hot wire chemical vapor deposition (HWCVD) technique onto crystalline silicon substrates, and the H bonding has been examined by infrared spectroscopy.
References
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Journal ArticleDOI

Infrared and Raman spectra of the silicon-hydrogen bonds in amorphous silicon prepared by glow discharge and sputtering

TL;DR: In this article, the number and nature of the silicon-hydrogen bonds in amorphous silicon films prepared in plasmas either of silane or of hydrogen and argon were studied.
Journal ArticleDOI

Structural interpretation of the vibrational spectra of a-Si: H alloys

TL;DR: In this article, the ir and Raman spectra of Si: H alloys produced by plasma decomposition of Si${\mathrm{H}}_{4}$ are studied for a wide range of deposition conditions.
Journal ArticleDOI

Dipolar Broadening of Magnetic Resonance Lines in Magnetically Diluted Crystals

TL;DR: In this article, the frequency moments associated with the dipolar broadening of magnetic resonance lines in crystals having lattice points populated at random by identical paramagnetic ions or nuclei were calculated.
Journal ArticleDOI

Zero Time Resolution Nuclear Magnetic Resonance Transient in Solids

TL;DR: In this article, a method for the experimental determination of the complete Bloch decay signal after a pulse for broad line nuclear magnetic resonances, as in solids, was described, which removes the necessity for constructing transient equipment of very short time resolution which would be extremely difficult.
Journal ArticleDOI

Infrared vibrational spectra of rf-sputtered hydrogenated amorphous silicon

TL;DR: In this article, the vibrational absorption spectra of amorphous sputtered alloys were reported for different conditions of substrate temperature, and hydrogen, oxygen, and argon partial pressures.
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