Journal ArticleDOI
Molecular glass photoresists for advanced lithography
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TLDR
Molecular glass resists as discussed by the authors are low molecular-weight organic photoresist materials that readily form stable amorphous glasses above room temperature and can produce fine features as small as 35 nm line/space patterns using either extreme UV or electron beam lithography.Abstract:
Molecular glass resists are low molecular-weight organic photoresist materials that readily form stable amorphous glasses above room temperature. We have created new families of molecular glass materials that function as both positive and negative resists capable of producing fine features as small as 35 nm line/space patterns using either extreme UV (13.4 nm) or electron beam lithography. These molecular glass resists have promising properties and are being considered as alternative choices to polymeric resists for next generation photoresist design.read more
Citations
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Directed block copolymer self-assembly for nanoelectronics fabrication
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Molecular Glass Resists as High‐Resolution Patterning Materials
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Multicomponent protein patterning of material surfaces
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Design principles for polymers as substratum for adherent cells
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Journal ArticleDOI
Characterization of the Photoacid Diffusion Length and Reaction Kinetics in EUV Photoresists with IR Spectroscopy
Shuhui Kang,Wen-Li Wu,Kwang-Woo Choi,Kwang-Woo Choi,Anuja De Silva,Christopher K. Ober,Vivek M. Prabhu +6 more
TL;DR: In this paper, a soft contact film transfer method was developed to prepare multilayer photoresist thin films that enable high-resolution spectroscopic and reflectivity measurements for determining the reaction−diffusion kinetic parameters and photoacid diffusion length.
References
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Journal ArticleDOI
Organic materials for electronic and optoelectronic devices
TL;DR: In this paper, the synthesis, properties, functions and potential applications for electronic and optoelectronic devices of photo-and electro-active organic materials are discussed, including amorphous molecular materials, titanyl phthalocyanine, oligothiophenes with well-defined structures, and non-conjugated polymers containing pendant oligothophenes or other π-electron systems.
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Photo- and electroactive amorphous molecular materials—molecular design, syntheses, reactions, properties, and applications
TL;DR: In this article, the recent progress of studies on photo-and electroactive amorphous molecular materials, highlighting photochromic amorphus molecular materials and their use in organic EL devices is discussed.
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Ultrahigh resolution of calixarene negative resist in electron beam lithography
TL;DR: In this paper, a nonpolymer material, calixarene derivative (hexaacetate p‐methnylcalix[6]arene) was tested as a high-resolution negative resist under an electron beam lithography process.
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Poly(p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resins
TL;DR: In this paper, an efficient synthetic route to pure, high molecular weight poly(p-hydroxystyrene) is reported, which involves synthesis of a new monomer, p-tert-butoxycarbonyloxystyrene, polymerization by radical initiation or by cationic initiation in liquid SO2, followed by thermolysis or acidolysis of the tertbutoxy carbonyl protecting group.
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Process optimization for production of sub-20 nm soft x-ray zone plates
TL;DR: In this article, the optimization of processes for producing sub-20 nm soft x-ray zone plates, using a general purpose electron beam lithography system and commercial resist technologies, was reported.