Journal ArticleDOI
Photolithography based on organosilane self-assembled monolayer resist
TLDR
In this paper, a micropatterning of organosilane self-assembled monolayers (SAMs) was demonstrated on the basis of photolithography using an excimer lamp radiating vacuum ultraviolet light of 172 nm wavelength.About:
This article is published in Electrochimica Acta.The article was published on 2001-09-01. It has received 53 citations till now. The article focuses on the topics: Resist & Photolithography.read more
Citations
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Journal ArticleDOI
Patterning self-assembled monolayers
TL;DR: In this paper, the authors introduce patterned features into both self-assembling monolayers and the substrates that support them as the parameters controlling SAM formation and dynamics are better understood.
Journal ArticleDOI
Electroless nickel, alloy, composite and nano coatings – A critical review
J. Sudagar,Jianshe Lian,Wei Sha +2 more
TL;DR: The development of metal deposition processes based on electroless nickel, alloy and composite coatings on various surfaces has witnessed a surge in interest among researchers, with many recent applications made possible from many excellent properties as mentioned in this paper.
Journal ArticleDOI
Engineering silicon oxide surfaces using self-assembled monolayers.
TL;DR: The controlled organization of molecules and molecular assemblies on silicon oxide will have a prominent place in "bottom-up" nanofabrication, which could revolutionize fields such as nanoelectronics and biotechnology in the near future.
Journal ArticleDOI
Effect of acidification treatment and morphological stability of sulfonated poly(arylene ether sulfone) copolymer proton‐exchange membranes for fuel‐cell use above 100 °C
Yu Seung Kim,Feng Wang,Michael A. Hickner,Stephan McCartney,Young Taik Hong,William L. Harrison,Thomas A. Zawodzinski,James E. McGrath +7 more
TL;DR: In this article, the effect of aging membranes based on BPSH and Nafion at elevated temperature on proton conductivity was discussed, and it was shown that the conductivity and water absorption were invariant with treatment temperature.
Journal ArticleDOI
Fabrication of patterned silane based self-assembled monolayers by photolithography and surface reactions on silicon-oxide substrates
TL;DR: An introduction into the plethora of possible structures, which have been created by the combination of photolithographic structuring approaches, and the integration of tailor made surface functionalities into these systems will be highlighted.
References
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Organized monolayers by adsorption. 1. Formation and structure of oleophobic mixed monolayers on solid surfaces
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Structure and reactivity of alkylsiloxane monolayers formed by reaction of alkyltrichlorosilanes on silicon substrates
TL;DR: In this article, the authors characterized the properties of ordered alkylsiloxane monolayer films and showed that they were stable in common organic solvents, water, and acid, but were destroyed by prolonged exposure to base.
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Deep uv photochemistry of chemisorbed monolayers : patterned coplanar molecular assemblies
Charles S. Dulcey,J. H. Georger,Victor Krauthamer,David A. Stenger,Thomas L. Fare,Jeffrey M. Calvert +5 more
TL;DR: Deep ultraviolet (UV) irradiation is shown to modify organosilane self-assembled monolayer (SAM) films by a photocleavage mechanism, which renders the surface amenable to further SAM modification.
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Coplanar molecular assemblies of amino- and perfluorinated alkylsilanes: characterization and geometric definition of mammalian cell adhesion and growth
David A. Stenger,Jacque H. Georger,Charles S. Dulcey,James J. Hickman,Alan S. Rudolph,Thor B. Nielsen,Stephen M. McCort,Jeffrey M. Calvert +7 more
TL;DR: The photochemistry of organosilanw was used to create mixed monolayers having continuously adjustable surface free energies and affect high resolution adhesion and spatial orientation of biological cells on silica substrates as mentioned in this paper.
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Fluoroalkylsilane Monolayers Formed by Chemical Vapor Surface Modification on Hydroxylated Oxide Surfaces
TL;DR: Water-repellent surfaces have been prepared by exposing Si substrates with a hydroxylated surface oxide to fluoroalkyl silane (FAS) vapor as mentioned in this paper.