Journal ArticleDOI
Reconstructed Structures of Symmetrical 〈011〉 Tilt Grain Boundaries in Silicon
TLDR
In this article, the authors measured the energy of symmetric tilt grain boundaries in silicon using the tight-binding type electronic theory (bond orbital model) and showed that these reconstructed structures are more stable than those with dangling bonds.Abstract:
The energies of reconstructed structures of symmetrical 〈011〉 tilt grain boundaries with θ > 70.53° in silicon are calculated using the tight-binding type electronic theory (bond orbital model). The energies of the most stable reconstructed boundary structures are in the same range or a little larger than those with θ ≦ 70.53°. These reconstructed structures are more stable than those with dangling bonds. There exists the continuity of boundary structure in the range 70.53° ≦ θ ≦ 148.41° (Σ = 27). Shallow cusps in the energy against θ curve can be found at special boundaries of type Σ = 3 (θ = 109.47°), Σ = 11 (θ = 129.52°), and Σ = 27 (θ = 148.41°), all of which are composed of one kind of original patterns. For θ > 148.41°, boundary structures are composed of an array of a0[100] edge dislocations.
Die Energien rekonstruierter Strukturen symmetrischer 〈011〉-Neigungskorngrenzen mit θ > 70,53° in Silizium werden mit der Elektronentheorie in der Naherung starker Kopplung (bond orbital model) berechnet. Die Energien der stabilsten rekonstruierten Korngrenzenstrukturen sind vergleichbar oder etwas groser als die der Korngrenzen mit θ ≦ 70,53°. Diese rekonstruierten Strukturen sind stabiler als die mit „dangling bonds”. Im Bereich 70,53° ≦ θ ≦ 148,41° (Σ = 27) existierten kontinuierliche Korngrenzenstrukturen. Flache Spitzen im Verlauf der Korngrenzen-energie uber θ konnen an speziellen Korngrenzen vom Typ Σ = 3 (θ = 109,47°), Σ = 11 (θ = = 129,52°) und Σ = 27 (θ = 148,41°), die sich alle aus einem Ursprungsmuster zusammensetzen, gefunden werden. Fur θ > 148,41° sind die Korngrenzenstrukturen aus einer Anordnung von a0[100]-Stufenversetzungen zusammengesetzt.read more
Citations
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Journal ArticleDOI
Excimer laser annealing of amorphous and solid-phase-crystallized silicon films
Mitsutoshi Miyasaka,J. Stoemenos +1 more
TL;DR: In this article, very thin (25-50-nm-thick) amorphous silicon (a-Si) films were crystallized into polycrystalline silicon (polysilicon) films by the combination of low temperature solid phase crystallization (SPC) and subsequent excimer laser annealing (ELA).
Journal ArticleDOI
Mode of growth and microstructure of polycrystalline silicon obtained by solid‐phase crystallization of an amorphous silicon film
TL;DR: In this paper, the structure and the morphology of crystallized amorphous silicon (α•Si) films which were deposited on glass and annealed in a conventional furnace or by rapid thermal process (RTP) are studied using transmission electron microscopy (TEM).
Journal ArticleDOI
Growth mechanism of twin-related and twin-free facet Si dendrites
TL;DR: In this article, the growth directions of typical facet Si dendrites were determined to be 〈2 ǫ 1/1/1 /1/0, 》 1 ǔ 0/0/0, à 0 à 1/0 à and à 2 Ã, using an electron backscatter pattern apparatus.
Journal ArticleDOI
Computational studies of grain boundaries in covalent materials
TL;DR: In this article, the properties of grain boundaries in semiconductors and covalent ceramics were investigated by using various computational schemes such as many-body interatomic potentials, tight-binding method and first-principles method.
Journal ArticleDOI
Modification Mechanism and Microstructural Characteristics of Eutectic Si in Casting Al-Si Alloys: A Review on Experimental and Numerical Studies
TL;DR: In this paper, a comprehensive review is conducted on the models proposed for the flaky silicon growth including twin-plane reentrant edge and the models for eutectic modification: impurity induced twinning and restricted growth theory.
References
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Journal ArticleDOI
Lattice imaging of a grain boundary in crystalline germanium
TL;DR: A high-angle tilt grain boundary viewed end-on in a (011) thin crystal of Ge has been imaged with atomic resolution in the Kyoto 500 kV electron microscope.
Journal ArticleDOI
Models of grain boundaries in the diamond lattice I. Tilt about I 10
TL;DR: In this article, it was shown that in the diamond lattice not only for small, but for all angles of tilt about [110] a dislocation model can be constructed.
Journal ArticleDOI
Atomic structure of [011] and [001] near-coincident tilt boundaries in germanium and silicon
C. D'anterroches,A. Bourret +1 more
TL;DR: In this article, the structure of pure tilt grain boundaries was investigated using high-resolution electron microscopy (HREM) and the resolution limit for the detection of the rigid body translation using HREM was established, and compared with the α-fringe technique.
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The structure of second and third order twin boundaries in silicon
TL;DR: In this article, a model for a symmetric (529)..sigma.. = 27 boundary was constructed and found to have the same periodicity and faceted structure as an experimentally observed (S.S. = 27).
Journal ArticleDOI
Models of grain boundaries in the diamond lattice: II. Tilt about 〈001〉 and theory
TL;DR: In this article, a model for large-angle grain boundaries with a tilt axis is presented for all angles of tilt, dislocations without dangling bonds can be used in the construction of these models.