Patent
Semiconductor device inspection method
TLDR
In this article, a device for inspecting semiconductor devices, which inspects intricate circuit patterns using images formed by the irradiation of white light, a laser light or an electron beam, is equipped with a function that enables automatic setting of a plurality of parameters in the inspection device by using semiconductor device design data.Abstract:Â
In the present invention, a device for inspecting semiconductor devices, which inspects intricate circuit patterns using images formed by the irradiation of white light, a laser light, or an electron beam, is equipped with a function that enables automatic setting of a plurality of parameters in the inspection device by using semiconductor device design data. This helps to improve the operation efficiency of inspection when the conditions required for inspection are set.read more
Citations
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Patent
Methods and systems for utilizing design data in combination with inspection data
TL;DR: In this paper, a computer-implemented method for binning defects detected on a wafer includes comparing portions of design data proximate positions of the defects in design data space.
Patent
Methods and systems for determining a position of inspection data in design data space
TL;DR: In this paper, a computer-implemented method for determining a centroid of an alignment target formed on a wafer using an image of the alignment target acquired by imaging the wafer is presented.
Patent
Methods and systems for inspection of wafers and reticles using designer intent data
Paul Frank Marella,Sharon Mccauley,Ellis Chang,William Volk,James Wiley,Sterling G. Watson,Sagar A. Kekare,Carl Hess +7 more
TL;DR: In this article, a system for inspection of wafers and reticles using designer intent data is described. Butler et al. present a method for detecting defects on a wafer by analyzing data generated by inspection of the wafer in combination with data representative of a reticle, which includes designations identifying different types of portions of the reticle.
Patent
Methods and systems for detecting defects in a reticle design pattern
Ingrid B. Peterson,Ed Yum +1 more
TL;DR: In this paper, computer-implemented methods and systems for detecting defects in a reticle design pattern are provided, which illustrate how the reticle pattern will be projected on a wafer by the exposure system at different values of one or more parameters of the wafer printing process.
Patent
Methods, systems, and carrier media for evaluating reticle layout data
TL;DR: In this article, a method for evaluating reticle layout data is presented, which includes generating a simulated image using the reticle layouts data as input to a model of a reticle manufacturing process.
References
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Patent
Design rule checking system and method
TL;DR: In this paper, a method for performing rule checking on OPC corrected or otherwise corrected designs is described, which comprises accessing a corrected design and generating a simulated image, which corresponds to a simulation of an image which would be printed on a wafer if the wafer were exposed to an illumination source directed through the corrected design.
Patent
Visual inspection and verification system
TL;DR: In this paper, a method and apparatus for inspecting a photolithography mask for defects is provided, which consists of providing a defect area image to an image simulator wherein the defect image is an image of a portion of a photochemical mask, and providing a set of lithography parameters as a second input to the image simulator.
Patent
Multi-pixel methods and apparatus for analysis of defect information from test structures on semiconductor devices
TL;DR: In this article, a method for detecting electrical defects on test structures of a semiconductor die is described, where the test structures each have a portion located partially within a scan area.
Patent
System and method for classifying an anomaly
A. Kathleen Hennessey,YouLing Lin,Rajasekar Reddy,C. Rinn Cleavelin,II Howard V. Hastings,Pinar Kinikoglu,Wan S. Wong +6 more
TL;DR: In this article, a method and system for generating and managing a knowledgebase for use in identifying anomalies on a manufactured object, such as a semiconductor wafer, includes measures for adding, deleting, and organizing data from the knowledgebase.
Patent
Method and apparatus for a network-based mask defect printability analysis system
TL;DR: In this paper, a network-based mask defect printability simulation server provides simulations, one-dimensional analysis, and reports to multiple clients over a wide area network, such as the Internet.