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Journal ArticleDOI

Thickness dependence of the properties of highly c-axis textured AlN thin films

F. Martin, +3 more
- 12 Feb 2004 - 
- Vol. 22, Iss: 2, pp 361-365
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TLDR
In this paper, the influence of film thickness on the material properties of aluminum nitride (AlN) thin films deposited on Pt(111) electrodes has been investigated experimentally by means of x-ray diffraction, dielectric response, atomic force microscopy, interferometry measurement of effective d33, and residual stress measurement.
Abstract
The influence of film thickness on the material properties of aluminum nitride (AlN) thin films deposited on Pt(111) electrodes has been investigated experimentally by means of x-ray diffraction, dielectric response, atomic force microscopy, interferometry measurement of effective d33, and residual stress measurement. The thickness was varied between 35 nm and 2 μm. Full width at mid-height of the rocking curve decreased from 2.60 to 1.14°, rms roughness increased from 3.8 to 18.6 A, the effective d33, namely d33,f, from 2.75 to 5.15 pm/V. The permittivity eAlN was stable at 10.2, whereas the dielectric losses decreased from 1% to 0.1%. The breakdown electric field under dc voltages varied between 4.0 and 5.5 MV/cm.

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Citations
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Ferroelectric thin films: Review of materials, properties, and applications

TL;DR: An overview of the state of the art in ferroelectric thin films is presented in this paper, where the authors review applications: micro-systems' applications, applications in high frequency electronics, and memories based on Ferroelectric materials.
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Enhancement of Piezoelectric Response in Scandium Aluminum Nitride Alloy Thin Films Prepared by Dual Reactive Cosputtering

TL;DR: This communication reports a hightemperature piezoelectric material that exhibits a good balance between high maximum use temperature and large piez Zoelectricity, achieved by the combination of the discovery of a phase transition in scandium aluminum nitride (ScxAl1 xN) alloy thin films and the use of dual co-sputtering, which leads to nonequilibrium alloy thin Films.
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A Review on Piezoelectric Energy Harvesting: Materials, Methods, and Circuits

TL;DR: In this paper, the state-of-the-art in micro-scale piezoelectric energy harvesting, summarizing key metrics such as power density and bandwidth of reported structures at low frequency input.
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Influence of growth temperature and scandium concentration on piezoelectric response of scandium aluminum nitride alloy thin films

TL;DR: In this paper, the authors investigated the influence of growth temperature and scandium concentration on the piezoelectric response of Scandium aluminum nitride (ScxAl1−xN) films prepared by dual reactive cosputtering.
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Piezoelectric MEMS for energy harvesting

TL;DR: In this paper, the authors present the current state of the art with respect to the key challenges such as high power density and wide bandwidth of operation, and describe improvements in piezoelectric materials and resonator structure design, which are believed to be the solutions to these challenges.
References
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Journal ArticleDOI

Measurement of piezoelectric coefficients of ferroelectric thin films

TL;DR: In this article, the normal load method is used to measure the coefficients for PZT thin films with various compositions prepared by the solgel technique or by organometallic chemical vapor deposition (OMCVD).
Journal ArticleDOI

Interferometric measurements of electric field-induced displacements in piezoelectric thin films

TL;DR: In this article, a double-beam interferometer was proposed to suppress the bending effect of the substrate bending motion in piezoelectric thin-film measurements, which was shown to resolve small displacements without using lock-in technique.
Journal ArticleDOI

Properties of aluminum nitride thin films for piezoelectric transducers and microwave filter applications

TL;DR: In this paper, a thin-film bulk acoustic resonator (TFBAR) with fundamental resonance at 3.6 GHz has been fabricated to assess resonator properties, and the material parameters derived from the thickness resonance were a coupling factor k=0.23 and a sound velocity vs.
Journal ArticleDOI

Zero-Temperature-Coefficient SAW Devices on AlN Epitaxial Films

TL;DR: In this article, the authors present technologies de couches minces de AlN for integrer the dispositifs a onde acoustique de surface, with a coefficient de variation thermique nul fonctionnant.

Zero-Temperature-Coefficient SAW Devices on A1N Epitaxial Films

Kazuo Tsubouchi, +1 more
TL;DR: In this article, the authors present technologies de couches minces de AlN for integrer the dispositifs a onde acoustique de surface, with a coefficient de variation thermique nul fonctionnant.
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