A
Abhinav Kranti
Researcher at Indian Institute of Technology Indore
Publications - 135
Citations - 2092
Abhinav Kranti is an academic researcher from Indian Institute of Technology Indore. The author has contributed to research in topics: Transistor & MOSFET. The author has an hindex of 24, co-authored 127 publications receiving 1728 citations. Previous affiliations of Abhinav Kranti include National Sun Yat-sen University & University College Cork.
Papers
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Journal ArticleDOI
Junctionless Multiple-Gate Transistors for Analog Applications
Rodrigo T. Doria,Marcelo Antonio Pavanello,Renan Trevisoli,M.M. De Souza,Chi-Woo Lee,Isabelle Ferain,Nima Dehdashti Akhavan,Ran Yan,Pedram Razavi,Ran Yu,Abhinav Kranti,Jean-Pierre Colinge +11 more
TL;DR: In this article, the analog properties of nMOS junctionless (JL) multigate transistors are compared with those exhibited by inversion-mode (IM) trigate devices of similar dimensions.
Book ChapterDOI
Junctionless Transistors: Physics and Properties
Jean-Pierre Colinge,Christopher W. Lee,N. Dehdashti Akhavan,Ran Yan,Isabelle Ferain,Pedram Razavi,Abhinav Kranti,Ran Yu +7 more
TL;DR: In this paper, the conduction mechanisms in three types of MOS devices: inversion-mode, accumulation-mode and junctionless MOSFETs are compared, and it is shown that junctionless transistors have different conduction properties from those of normal MOSFs.
Journal ArticleDOI
High-Performance Junctionless MOSFETs for Ultralow-Power Analog/RF Applications
TL;DR: In this paper, the authors demonstrate the usefulness of ultralow power junctionless (JL) MOSFETs in achieving improved analog/RF metrics as compared to non-underlap and underlap devices.
Journal ArticleDOI
Ultra Low Power Junctionless MOSFETs for Subthreshold Logic Applications
TL;DR: In this article, the potential of junctionless (JL) MOS transistors for ultra low power (ULP) subthreshold logic applications was reported, which showed that double gate (DG) JL devices, which do not require source or drain extension region engineering, can perform significantly better than conventional inversion mode devices, and comparable with underlap DG MOSFETs for ULP applications.
Journal ArticleDOI
Forming-free high-endurance Al/ZnO/Al memristor fabricated by dual ion beam sputtering
A. Kumar,Mangal Das,Vivek Garg,Brajendra S. Sengar,Myo Than Htay,Shailendra Kumar,Abhinav Kranti,Shaibal Mukherjee +7 more
TL;DR: In this article, dual ion beam sputtering fabrication of an Al/ZnO/Al memristor displaying forming-free bipolar resistive switching characteristics with memristive behavior without necessitating any post-processing steps.