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Alvin H. Leung
Researcher at Sandia National Laboratories
Publications - 13
Citations - 264
Alvin H. Leung is an academic researcher from Sandia National Laboratories. The author has contributed to research in topics: Extreme ultraviolet lithography & Extreme ultraviolet. The author has an hindex of 10, co-authored 13 publications receiving 257 citations.
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Proceedings ArticleDOI
System integration and performance of the EUV engineering test stand
Daniel A. Tichenor,Avijit K. Ray-Chaudhuri,William C. Replogle,Richard H. Stulen,Glenn D. Kubiak,Paul D. Rockett,Leonard E. Klebanoff,Karen J. Jefferson,Alvin H. Leung,John B. Wronosky,Layton C. Hale,Henry N. Chapman,John S. Taylor,James A. Folta,Claude Montcalm,Regina Soufli,Eberhard Spiller,Kenneth L. Blaedel,Gary E. Sommargren,Donald W. Sweeney,Patrick P. Naulleau,Kenneth A. Goldberg,Eric M. Gullikson,Jeffrey Bokor,Phillip J. Batson,David Attwood,Keith H. Jackson,Scott Daniel Hector,Charles W. Gwyn,Pei-yang Yan +29 more
TL;DR: The Engineering Test Stand (ETS) as mentioned in this paper is a developmental lithography tool designed to demonstrate full-field EUV imaging and provide data for commercial tool development, and it is configured using a developmental projection system, while fabrication of an improved projection system proceeds in parallel.
Journal ArticleDOI
First lithographic results from the extreme ultraviolet Engineering Test Stand
Henry N. Chapman,Avijit K. Ray-Chaudhuri,Daniel A. Tichenor,William C. Replogle,Richard H. Stulen,Glenn D. Kubiak,Paul D. Rockett,Leonard E. Klebanoff,Donna J. O'Connell,Alvin H. Leung,Karen L. Jefferson,John B. Wronosky,J. Taylor,Layton C. Hale,Kenneth L. Blaedel,Eberhard Spiller,G. E. Sommargren,James A. Folta,Donald W. Sweeney,E. M. Gullikson,Patrick P. Naulleau,Kenneth A. Goldberg,Jeffrey Bokor,David Attwood,Uwe Mickan,Ralph M. Hanzen,Eric M. Panning,Pei-yang Yan,Charles W. Gwyn,Sang H. Lee +29 more
TL;DR: The Extreme ultraviolet Engineering Test Stand (ETS) as mentioned in this paper is a step-and-scan lithography tool that operates at a wavelength of 13.4 nm and is used to demonstrate full-field EUV imaging and acquire system learning for equipment manufacturers to develop commercial tools.
Journal ArticleDOI
Verification studies of thermophoretic protection for extreme ultraviolet masksa)
TL;DR: In this article, a thermophoretic pellicle was proposed as an alternative to the traditional organic pellicles as a means of protecting extreme ultraviolet (EUV) photomasks from particle contamination.
Proceedings ArticleDOI
Initial results from the EUV engineering test stand
Daniel A. Tichenor,Avijit K. Ray-Chaudhuri,Sang Hun Lee,Henry N. Chapman,William C. Replogle,Kurt W. Berger,Richard H. Stulen,Glenn D. Kubiak,Leonard E. Klebanoff,John B. Wronosky,Donna J. O'Connell,Alvin H. Leung,Karen J. Jefferson,W. P. Ballard,Layton C. Hale,Kenneth L. Blaedel,John S. Taylor,James A. Folta,Eberhard Spiller,Regina Soufli,Gary E. Sommargren,Donald W. Sweeney,Patrick P. Naulleau,Kenneth A. Goldberg,Eric M. Gullikson,Jeffrey Bokor,David Attwood,Uwe Mickan,Ralph M. Hanzen,Eric M. Panning,Pei-yang Yan,J. E. Bjorkholm,Charles W. Gwyn +32 more
TL;DR: The Engineering Test Stand (ETS) as mentioned in this paper is an EUV lithography tool designed to demonstrate full-field EUV imaging and provide data required to accelerate production-tool development.
Proceedings ArticleDOI
First environmental data from the EUV engineering test stand
Leonard E. Klebanoff,Michael E. Malinowski,Philip A. Grunow,W. Miles Clift,Chip Steinhaus,Alvin H. Leung,Steven J. Haney +6 more
TL;DR: The first environmental data from the Engineering Test Stand (ETS) has been collected and analyzed in this article, showing that the ETS environment does not pose a contamination risk to the optics in the absence of EUV irradiation, but with EUV exposure, the water rich environment can lead to EUV-induced water oxidation of the Si-terminated Mo/Si optics.