B
Brendan McCarthy
Researcher at Tyndall National Institute
Publications - 13
Citations - 2344
Brendan McCarthy is an academic researcher from Tyndall National Institute. The author has contributed to research in topics: Electron-beam lithography & Wafer. The author has an hindex of 7, co-authored 13 publications receiving 2092 citations.
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Journal ArticleDOI
Nanowire transistors without junctions
Jean-Pierre Colinge,Chi-Woo Lee,Aryan Afzalian,Aryan Afzalian,Nima Dehdashti Akhavan,Ran Yan,Isabelle Ferain,Pedram Razavi,B. O'Neill,Alan Blake,Mary White,Anne-Marie Kelleher,Brendan McCarthy,Richard Murphy +13 more
TL;DR: A new type of transistor in which there are no junctions and no doping concentration gradients is proposed and demonstrated, which has near-ideal subthreshold slope, extremely low leakage currents, and less degradation of mobility with gate voltage and temperature than classical transistors.
Proceedings ArticleDOI
SOI gated resistor: CMOS without junctions
Jean-Pierre Colinge,Christopher W. Lee,Aryan Afzalian,Nima Dehdashti,Ran Yan,Isabelle Ferain,Pedram Razavi,B. O'Neill,Alan Blake,Mary White,Anne-Marie Kelleher,Brendan McCarthy,Richard Murphy +12 more
TL;DR: In this article, the authors report the fabrication of junctionless SOI MOSFETs, which greatly simplify processing thermal budget and behave as regular multigate SOI transistors.
Journal ArticleDOI
Characterisation of a novel electron beam lithography resist, SML and its comparison to PMMA and ZEP resists
Anushka S. Gangnaik,Yordan M. Georgiev,Brendan McCarthy,Nikolay Petkov,Vladimir Djara,Justin D. Holmes +5 more
TL;DR: In this article, a positive-tone electron beam resist known as SLM is presented and compared to well-established positive resists such as 950K polymethyl methacrylate (PMMA) and ZEP 520A.
Journal ArticleDOI
The curious case of thin-body Ge crystallization
Ray Duffy,Maryam Shayesteh,Brendan McCarthy,Alan Blake,Mary Anne White,Jim Scully,Ran Yu,Anne-Marie Kelleher,Michael Schmidt,Nikolay Petkov,Lourdes Pelaz,Luis A. Marqués +11 more
TL;DR: In this paper, the authors investigate the templated crystallization of thin-body Ge fin structures with high aspect ratios, with fin structures oriented in the 〈110〉 direction.
Journal ArticleDOI
High aspect ratio nano-fabrication of photonic crystal structures on glass wafers using chrome as hard mask.
TL;DR: The presented nano-fabrication method provides PhC structures necessary for a high quality optical response and fabricated a refractive index based PhC sensor which shows a sensitivity of 185 nm per RIU.