This article reviews the basic theoretical aspects of graphene, a one-atom-thick allotrope of carbon, with unusual two-dimensional Dirac-like electronic excitations. The Dirac electrons can be controlled by application of external electric and magnetic fields, or by altering sample geometry and/or topology. The Dirac electrons behave in unusual ways in tunneling, confinement, and the integer quantum Hall effect. The electronic properties of graphene stacks are discussed and vary with stacking order and number of layers. Edge (surface) states in graphene depend on the edge termination (zigzag or armchair) and affect the physical properties of nanoribbons. Different types of disorder modify the Dirac equation leading to unusual spectroscopic and transport properties. The effects of electron-electron and electron-phonon interactions in single layer and multilayer graphene are also presented.

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The electronic properties of graphene

抗原变异可使得多种致病微生物易于逃避宿主免疫应答。表达在感染红细胞表面的恶性疟原虫红细胞表面蛋白1（PfPMP1）与感染红细胞、内皮细胞、树突状细胞以及胎盘的单个或多个受体作用，在黏附及免疫逃避中起关键的作用。每个单倍体基因组var基因家族编码约60种成员，通过启动转录不同的var基因变异体为抗原变异提供了分子基础。

疟原虫var基因转换速率变化导致抗原变异[英]／Paul H, Robert P, Christodoulou Z, et al//Proc Natl Acad Sci U S A

We measured the elastic properties and intrinsic breaking strength of free-standing monolayer graphene membranes by nanoindentation in an atomic force microscope. The force-displacement behavior is interpreted within a framework of nonlinear elastic stress-strain response, and yields second- and third-order elastic stiffnesses of 340 newtons per meter (N m(-1)) and -690 Nm(-1), respectively. The breaking strength is 42 N m(-1) and represents the intrinsic strength of a defect-free sheet. These quantities correspond to a Young's modulus of E = 1.0 terapascals, third-order elastic stiffness of D = -2.0 terapascals, and intrinsic strength of sigma(int) = 130 gigapascals for bulk graphite. These experiments establish graphene as the strongest material ever measured, and show that atomically perfect nanoscale materials can be mechanically tested to deformations well beyond the linear regime.

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Measurement of the Elastic Properties and Intrinsic Strength of Monolayer Graphene

Graphene is a wonder material with many superlatives to its name. It is the thinnest known material in the universe and the strongest ever measured. Its charge carriers exhibit giant intrinsic mobility, have zero effective mass, and can travel for micrometers without scattering at room temperature. Graphene can sustain current densities six orders of magnitude higher than that of copper, shows record thermal conductivity and stiffness, is impermeable to gases, and reconciles such conflicting qualities as brittleness and ductility. Electron transport in graphene is described by a Dirac-like equation, which allows the investigation of relativistic quantum phenomena in a benchtop experiment. This review analyzes recent trends in graphene research and applications, and attempts to identify future directions in which the field is likely to develop.

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Graphene: Status and Prospects

Problems associated with large-scale pattern growth of graphene constitute one of the main obstacles to using this material in device applications. Recently, macroscopic-scale graphene films were prepared by two-dimensional assembly of graphene sheets chemically derived from graphite crystals and graphene oxides. However, the sheet resistance of these films was found to be much larger than theoretically expected values. Here we report the direct synthesis of large-scale graphene films using chemical vapour deposition on thin nickel layers, and present two different methods of patterning the films and transferring them to arbitrary substrates. The transferred graphene films show very low sheet resistance of approximately 280 Omega per square, with approximately 80 per cent optical transparency. At low temperatures, the monolayers transferred to silicon dioxide substrates show electron mobility greater than 3,700 cm(2) V(-1) s(-1) and exhibit the half-integer quantum Hall effect, implying that the quality of graphene grown by chemical vapour deposition is as high as mechanically cleaved graphene. Employing the outstanding mechanical properties of graphene, we also demonstrate the macroscopic use of these highly conducting and transparent electrodes in flexible, stretchable, foldable electronics.

Large-scale pattern growth of graphene films for stretchable transparent electrodes

Titanium nitride (TiN) thin film coatings were studied by field emission microscopy and spectroscopy. Coated tungsten tips were found to be capable of emitting extremely high currents at low extraction voltages (∼1 mA at 900–1700 V). Current fluctuations for >400 μA total emission from a single tip were 7% rms, measured over ∼ 1 h. Electron energy distributions measured <0.4 eV (full width at half‐maximum). Since TiN thin films are commonly used in the microelectronics industry, TiN coatings have the potential for being a relatively simple and widely accessible method for improving the performance of cold field emission sources.

Titanium nitride coated tungsten cold field emission sources

High resolution processes are demonstrated with a positive-mode chemically amplified AXT top surface imaging resist system exposed with a low energy electron beam. Top surface imaging is an ideal match to low energy electron beam lithography because it allows thick resist layers to be patterned despite the limited penetration depth of the electron beam. The three key steps of the process are exposure, silylation, and etch development. All three steps influence the final process sensitivity, contrast, and resolution. The AXT has a poly(hydroxy styrene) base resin, and has been formulated both with and without a dye used to enhance optical absorption. We have achieved sub 100 nm resolution both with and without a postexposure bake. Critical area doses below 1 μC/m2 are demonstrated. The edge roughness and density of etch residue from silylation defects have been compared for a variety of oxygen plasma etch systems.

Low energy electron beam top surface image processing using chemically amplified AXT resist

Organic Solar Cells: Current Collecting Grids for ITO‐Free Solar Cells (Adv. Energy Mater. 1/2012)

A scanning tunneling microscope (STM) has been used to study the topology of the surfaces of a series of thin hydrogenated amorphous silicon (a-Si:H) films deposited by rf discharge from pure silane. The substrates were atomically flat, oxide-free, single-crystal Si (100). Films were grown in our laboratory and transferred to the STM with no air exposure between growth and measurement. A series of thin films between 1 and 50 nm in thickness reveals the initial growth stage of a-Si:H on Si (100). Initial nucleation and islanding can be seen on these films. The surface has a distribution of island sizes. The rms roughness and a surface lateral correlation length were measured as functions of film thickness. The rms roughness grows sublinearly with thickness from 0.3–0.5 nm as the film thickness is raised from 1 to 50 nm. The lateral size of the surface features also grows with film thickness. The growth of the roughness and correlation length can be compared with the dynamic scaling model. In addition, the topographs reveal occasional structures of larger size and low density on the film surface. These structures are nanoparticles of silicon deposited from the plasma during film growth. The frequency of these features scales with film thickness, and represents 10−510−4 of the total film volume.

https://www.cambridge.org/core/services/aop-cambridge-core/content/view/S1946427400312167

Growth and Nucleation of Hydrogenated Amorphous Silicon on Silicon (100) Surfaces

A scanning tunneling microscope has been used to study the topology of the surface of device-quality, hydrogenated Amorphous silicon deposited by rf discharge from silane or “hot wire” CVD. The substrates were oxide-free single-crystal silicon or GaAs. Films studied were either grown in our laboratory and observed with no air exposure, or grown at other laboratories producing device-quality photovoltaic cells and viewed after air exposures of less than 30 Minutes. Thin films (10 nm) representing early growth stages appear significantly smoother than the thicker films. The topology of thick films (> 50 nm) has large variations over individual samples. While many regions can be characterized as “rolling hills”, atomically flat areas are sometimes observed nearby in our films. In most regions the observed slopes were 10% or less from the horizontal, but some steep-sided valleys, indicating incipient voids, are seen. Overall surface roughness measured on sub-Micron areas of our films is very inhomogeneous. Uniformity of the films grown off site was much better, although no atomically flat regions were observed, surface roughness can be estimated.

David M. Tanenbaum

Papers

Titanium nitride coated tungsten cold field emission sources

Low energy electron beam top surface image processing using chemically amplified AXT resist

Organic Solar Cells: Current Collecting Grids for ITO‐Free Solar Cells (Adv. Energy Mater. 1/2012)

Growth and Nucleation of Hydrogenated Amorphous Silicon on Silicon (100) Surfaces

Nanoscale Study of the Hydrogenated Amorphous Silicon Surface