D
David T. Shaw
Researcher at University at Buffalo
Publications - 157
Citations - 3305
David T. Shaw is an academic researcher from University at Buffalo. The author has contributed to research in topics: Thin film & Deposition (phase transition). The author has an hindex of 28, co-authored 157 publications receiving 3244 citations. Previous affiliations of David T. Shaw include State University of New York System.
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BookDOI
Nanostructure Science and Technology
Richard W. Siegel,Evelyn L. Hu,Donald M. Cox,Herb Goronkin,Lynn Jelinski,Carl C. Koch,John Mendel,Mihail C. Roco,David T. Shaw +8 more
TL;DR: In this article, the authors present a series of books to cover as much of the subject matter as possible, from physics and chemistry to biology and medicine, and from basic science to applications.
Journal ArticleDOI
Deposition of superconducting Y‐Ba‐Cu‐O films at 400 °C without post‐annealing
TL;DR: In this article, a superconducting thin film of Y1Ba2Cu3O7−x was fabricated using the process of plasma assisted laser deposition and the substrate temperature was as low as 400°C and high-temperature postannealing in an O2 atmosphere was not necessary.
Journal ArticleDOI
Field emission of different oriented carbon nanotubes
TL;DR: In this article, field emission data from aligned high-density carbon nanotubes (CNTs) with orientations parallel, 45°, and perpendicular to the substrate have been obtained.
Journal ArticleDOI
Generation of high‐energy atomic beams in laser‐superconducting target interactions
TL;DR: In this article, high energy atomic beams with Mach numbers as high as 5 were observed in excimer laser-superconducting target interactions and the velocity distributions of the Y, Ba, Cu, and O atoms and ions could be described very well by a supersonic expansion-type mechanism similar to a molecule beam.
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Role of the oxygen atomic beam in low-temperature growth of superconducting films by laser deposition
TL;DR: In this article, the behavior of the velocity distributions of all atomic beams was studied as a function of the distance from the target and laser energy fluence, and a target-substrate separation of 7 cm was found to be optimum in terms of producing the best asdeposited films.