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Dominique Drouin
Researcher at Université de Sherbrooke
Publications - 213
Citations - 4353
Dominique Drouin is an academic researcher from Université de Sherbrooke. The author has contributed to research in topics: Silicon & Cathodoluminescence. The author has an hindex of 22, co-authored 204 publications receiving 3798 citations. Previous affiliations of Dominique Drouin include Institut national des sciences Appliquées de Lyon & STMicroelectronics.
Papers
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Journal ArticleDOI
Exploiting Non-idealities of Resistive Switching Memories for Efficient Machine Learning
Victor Yon,Amirali Amirsoleimani,Fabien Alibart,Roger G. Melko,Dominique Drouin,Yann Beilliard +5 more
TL;DR: This short review introduces some key considerations for circuit design and the most common non-idealities, and illustrates the possible benefits of stochasticity and compression with examples of well-established software methods.
Posted Content
Low cost Ge/Si virtual substrate through dislocation trapping by nanovoids
Youcef A. Bioud,Abderraouf Boucherif,Etienne Paradis,Ali Soltani,Dominique Drouin,Richard Arès +5 more
TL;DR: In this article, a low-cost method to reduce the threading disloca-tions density (TDD) in relaxed germanium epilayers grown on silicon (Si) substrates is presented.
Proceedings ArticleDOI
ExaNoDe: combined integration of chiplets on active interposer with bare dice in a multi-chip-module for heterogeneous and scalable high performance compute nodes
P.-Y. Martinez,Yann Beilliard,Maxime Godard,David Danovitch,Dominique Drouin,Jean Charbonnier,P. Coudrain,Arnaud Garnier,Didier Lattard,Pascal Vivet,Severine Cheramy,Eric Guthmuller,C. Fuguet Tortolero,V. Mengue,J. Durupt,A. Philippe,Denis Dutoit +16 more
TL;DR: The reported ExaNoDe multi-chip-module (MCM) demonstrates that the multi-level integration flow enables tight integration of hardware accelerators in a heterogeneous HPC compute node.
Patent
Fabrication process for high resolution lithography masks using evaporated or plasma assisted electron sensitive resists with plating image reversal
TL;DR: In this paper, a method for fabricating a high resolution lithography mask, comprising providing a blank mask, coating the blank mask with a conductive layer, depositing a negative electron sensitive resist layer on the conductive surface, applying an electron beam irradiation to the negative electron-sensitive resist layer to form patterns of non-soluble resist, dissolving the negative ERS layer to leave on theconductive layer only the patterns of nonsluble resist and conducting a directional etch through the patterns not protected by the plated etch-resistant material to transfer these patterns into
Proceedings ArticleDOI
Signals to Spikes for Neuromorphic Regulated Reservoir Computing and EMG Hand Gesture Recognition
TL;DR: In this paper, the spike encoded data is processed through a spiking reservoir with a biologically inspired topology and neuron model, which yields better performance than state-of-the-art convolutional neural networks.