H
Hiroki Kondo
Researcher at Nagoya University
Publications - 501
Citations - 7926
Hiroki Kondo is an academic researcher from Nagoya University. The author has contributed to research in topics: Etching (microfabrication) & Plasma etching. The author has an hindex of 41, co-authored 483 publications receiving 7010 citations. Previous affiliations of Hiroki Kondo include Toyota & Kobe University.
Papers
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Proceedings ArticleDOI
Real-time control of a wafer temperature for uniform plasma process
TL;DR: In this article, a non-contact method for measurement of temperature of silicon wafer by using autocorrelation-type fourier domain low coherence interferometer has been developed.
Patent
Control device for vehicular power force transmitting device
Akihide Ito,Daisuke Inoue,Fukao Mitsuhiro,Kenji Matsuo,Hiroki Kondo,Kimura Motonobu,Sakamoto Kazuya +6 more
TL;DR: In this article, the authors proposed a control device for a vehicular power force transmitting device for restraining a driver from feeling a sense of discomfort when the transmitting device is recovered from a fail-safe state.
Patent
Procede et dispositif de controle de commutation des rapports de transmission d'une transmission continuellement variable
Tadashi Tamura,Kideki Yasue,Katsumi Kono,Daisuke Inoue,Yoshiaki Yamamoto,Hiroki Kondo,Hiroji Taniguchi,Keiji Matsuo,Yuji Hattori +8 more
TL;DR: In this article, a variation continue (CVT) is applied to the controle d'une transmission in order to avoid inconvenients provoques par une reduction importante de the temperature du fluide d'actionnement.
Journal ArticleDOI
Suppressive Effect of Interface Reaction and Water Absorption by Al Incorporation into Pr-oxide Film
Wakana Takeuchi,K. Furuta,Kimihiko Kato,Mitsuo Sakashita,Hiroki Kondo,Osamu Nakatsuka,Shigeaki Zaima +6 more
TL;DR: In this paper, the effects of Al incorporation into a Pr-oxide/Si gate stack formed by atomic layer deposition were investigated, and it was shown that Al incorporation is effective against the inhibition of moisture incorporation into the oxide film.