H
Hiroki Kondo
Researcher at Nagoya University
Publications - 501
Citations - 7926
Hiroki Kondo is an academic researcher from Nagoya University. The author has contributed to research in topics: Etching (microfabrication) & Plasma etching. The author has an hindex of 41, co-authored 483 publications receiving 7010 citations. Previous affiliations of Hiroki Kondo include Toyota & Kobe University.
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Is Prophylactic Splenectomy Necessary for Proximal Advanced Gastric Cancer Invading the Greater Curvature with Clinically Negative Splenic Hilar Lymph Node Metastasis? A Multi-Institutional Cohort Study (YCOG2003)
Sho Sato,Chikara Kunisaki,Hiroki Kondo,Nobuhiro Tsuchiya,Yusaku Tanaka,Masazumi Takahashi,Kei Sato,Jun Kimura,Hidetaka Ono,Hirochika Makino,Yu Tamura,Kohei Kasahara,Takashi Kosaka,Hirotoshi Akiyama,Itaru Endo +14 more
TL;DR: Prophylactic splenectomy showed more frequent postoperative morbidities and a longer hospital stay than spleen preservation, without any long-term survival benefits.
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Electron Spin Resonance (ESR) Observation of Radicals on Biological Organism Interacted with Plasmas
Kenji Ishikawa,Hiroko Moriyama,Kazuhiro Tamiya,Hiroshi Hashizume,Takayuki Ohta,Masafumi Ito,Sachiko Iseki,Hiromasa Tanaka,Keigo Takeda,Hiroki Kondo,Makoto Sekine,Masaru Hori +11 more
TL;DR: Realtime in situ ESR has proven to be a useful method to elucidate plasma-induced surface reactions on biological specimens and successfully obtained information regarding the reaction mechanism with free radicals.
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Controlled Synthesis of Carbon Nanowalls for Carbon Channel Engineering
TL;DR: In this paper, the growth mechanisms of carbon nanowalls (CNWs) were investigated using two plasma-enhanced chemical vapor deposition (PECVD) systems that permit the densities and energies of radicals and ions to be precisely controlled.
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Analysis of Stressed-Gate SiO2 Films with Electron Injection by Conductive Atomic Force Microscopy ∗∗
TL;DR: In this paper, the degradation of gate SiO2 films observed in metal-oxide-semiconductor (MOS) capacitors by using conductive atomic force microscopy (C-AFM) was detected.
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Effects of High-Quality Carbon Nanowalls Ionization-Assisting Substrates on Surface-Assisted Laser Desorption/Ionization Mass Spectrometry Performance
Ryusei Sakai,Hiroki Kondo,A. Ishikawa,Takayuki Ohta,Mineo Hiramatsu,Hiromasa Tanaka,Masaru Hori +6 more
TL;DR: In this article , high quality carbon nanowalls (CNWs) were grown using a radical-injection plasma-enhanced chemical vapor deposition (RI-PECVD) system with the addition of oxygen in a mixture of CH4 and H2 gases.