http://nathan.instras.com/ResearchProposalDB/doc-109.pdf

A review on polymer nanofibers by electrospinning and their applications in nanocomposites

https://cmapspublic3.ihmc.us/rid=1N3976C22-12M3P49-9V/Holladay%20et%20al.%20-%202009%20-%20An%20overview%20of%20hydrogen%20production%20technologies.pdf

An overview of hydrogen production technologies

Atomic layer deposition(ALD), a chemical vapor deposition technique based on sequential self-terminating gas–solid reactions, has for about four decades been applied for manufacturing conformal inorganic material layers with thickness down to the nanometer range. Despite the numerous successful applications of material growth by ALD, many physicochemical processes that control ALD growth are not yet sufficiently understood. To increase understanding of ALD processes, overviews are needed not only of the existing ALD processes and their applications, but also of the knowledge of the surface chemistry of specific ALD processes. This work aims to start the overviews on specific ALD processes by reviewing the experimental information available on the surface chemistry of the trimethylaluminum/water process. This process is generally known as a rather ideal ALD process, and plenty of information is available on its surface chemistry. This in-depth summary of the surface chemistry of one representative ALD process aims also to provide a view on the current status of understanding the surface chemistry of ALD, in general. The review starts by describing the basic characteristics of ALD, discussing the history of ALD—including the question who made the first ALD experiments—and giving an overview of the two-reactant ALD processes investigated to date. Second, the basic concepts related to the surface chemistry of ALD are described from a generic viewpoint applicable to all ALD processes based on compound reactants. This description includes physicochemical requirements for self-terminating reactions,reaction kinetics, typical chemisorption mechanisms, factors causing saturation, reasons for growth of less than a monolayer per cycle, effect of the temperature and number of cycles on the growth per cycle (GPC), and the growth mode. A comparison is made of three models available for estimating the sterically allowed value of GPC in ALD. Third, the experimental information on the surface chemistry in the trimethylaluminum/water ALD process are reviewed using the concepts developed in the second part of this review. The results are reviewed critically, with an aim to combine the information obtained in different types of investigations, such as growth experiments on flat substrates and reaction chemistry investigation on high-surface-area materials. Although the surface chemistry of the trimethylaluminum/water ALD process is rather well understood, systematic investigations of the reaction kinetics and the growth mode on different substrates are still missing. The last part of the review is devoted to discussing issues which may hamper surface chemistry investigations of ALD, such as problematic historical assumptions, nonstandard terminology, and the effect of experimental conditions on the surface chemistry of ALD. I hope that this review can help the newcomer get acquainted with the exciting and challenging field of surface chemistry of ALD and can serve as a useful guide for the specialist towards the fifth decade of ALD research.

Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

Effective thermal conductivity of mixtures of e uids and nanometer-size particles is measured by a steady-state parallel-plate method. The tested e uids contain two types of nanoparticles, Al 2O3 and CuO, dispersed in water, vacuum pump e uid, engine oil, and ethylene glycol. Experimental results show that the thermal conductivities of nanoparticle ‐e uid mixtures are higher than those of the base e uids. Using theoretical models of effective thermal conductivity of a mixture, we have demonstrated that the predicted thermal conductivities of nanoparticle ‐e uid mixtures are much lower than our measured data, indicating the dee ciency in the existing models when used for nanoparticle ‐e uid mixtures. Possible mechanisms contributing to enhancement of the thermal conductivity of the mixtures are discussed. A more comprehensive theory is needed to fully explain the behavior of nanoparticle ‐e uid mixtures. Nomenclature cp = specie c heat k = thermal conductivity L = thickness Pe = Peclet number P q = input power to heater 1 r = radius of particle S = cross-sectional area T = temperature U = velocity of particles relative to that of base e uids ® = ratio of thermal conductivity of particle to that of base liquid ¯ = .® i 1/=.® i 2/ ° = shear rate of e ow Ω = density A = volume fraction of particles in e uids Subscripts

/pdf/thermal-conductivity-of-nanoparticle-fluid-mixture-54tj4jnmls.pdf

Thermal Conductivity of Nanoparticle -Fluid Mixture

Recent advances in friction-stir welding : Process, weldment structure and properties

Materials Research Society Symposium - Proceedings

Low-temperature bonding of wafers has been studied utilizing reactive ion etching-mode plasma activation. The hydrophilic Si and thermally oxidized Si wafers were exposed to N 2 , Ar, or O 2 plasma prior to bonding in air or vacuum. After plasma treatment the wafers were cleaned in RCA-1 solution and/or deionized water. Strong bonding was achieved at 200°C with all the investigated plasma gases, if proper bonding and cleaning procedures were used. Extended RCA-I cleaning deteriorated the bond strength, but a short cleaning improved bonding. We found that the activation of the thermal oxide has a larger influence on the bond strength than the activation of the native oxide surface in Si/oxide wafer pairs. We suggest that the plasma treatment induces a highly disordered surface structure which enhances the diffusion of the water from the bonded interface. As a result of the plasma exposure the number of the surface OH groups is greatly increased enabling strong bonding at a low temperature.

/pdf/effects-of-plasma-activation-on-hydrophilic-bonding-of-si-1dowpwo6sf.pdf

Effects of Plasma Activation on Hydrophilic Bonding of Si and SiO2

Reactive sputter deposition and properties of Ta x N thin films

Mechanically induced layer transfer of single-crystal silicon by hydrogen ion implantation, low-temperature wafer bonding, and subsequent mechanical splitting of the implanted wafer has been investigated. The bond strength measurements using the crack opening method in room environment yield a surface energy of ⩾2000 mJ/m2 after exposure to oxygen plasma and subsequent hydrophilic silicon/silicon dioxide bonding at 200 °C. Mechanically induced layer transfer was carried out for silicon wafers implanted to a dose of 5×1016 H2/cm2 at 100 keV and annealed for 2 h at 200 °C. No feature was observed by atomic force microscopy (AFM) measurements on the unbonded free surface after this heat treatment. For lower doses of implantation, annealing at higher temperatures is required to enable the mechanical transfer. AFM measurements on the split silicon surface indicate that low-temperature wafer bonding and mechanical transfer yield a root mean square surface roughness of 4 nm which is less than in the standard Smart-Cut® process.

Mechanically induced Si layer transfer in hydrogen-implanted Si wafers

Single-crystalline silicon thin film on glass (cSOG) has been prepared using an "ion-cutting" based "layer-transfer" technique. Low-temperature processed thin-film transistors, fabricated both on cSOG and metal-induced laterally crystallized polycrystalline silicon, have been characterized and compared. The cSOG-based transistors performed comparatively better, exhibiting a significantly higher electron field-effect mobility (/spl sim/430 cm/sup 2//Vs), a steeper subthreshold slope and a lower leakage current that was also relatively insensitive to gate bias.

Ilkka Suni

Papers

Materials Research Society Symposium - Proceedings

Effects of Plasma Activation on Hydrophilic Bonding of Si and SiO2

Reactive sputter deposition and properties of Ta x N thin films

Mechanically induced Si layer transfer in hydrogen-implanted Si wafers

Characterization of low-temperature processed single-crystalline silicon thin-film transistor on glass