J
J.-L. Dorier
Researcher at École Polytechnique Fédérale de Lausanne
Publications - 41
Citations - 1637
J.-L. Dorier is an academic researcher from École Polytechnique Fédérale de Lausanne. The author has contributed to research in topics: Silane & Plasma. The author has an hindex of 21, co-authored 40 publications receiving 1594 citations.
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Frequency effects in silane plasmas for plasma enhanced chemical vapor deposition
TL;DR: In this paper, the authors compared the excitation frequency in radio-frequency (RF) plasmas with the 13.56 MHz industrial frequency in the same reactor and presented a comparative study of key discharge parameters such as deposition rates, plasma uniformity, ion impact energy, power transfer efficiency, and powder formation.
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Time-resolved measurements of highly polymerized negative ions in radio frequency silane plasma deposition experiments
TL;DR: In this article, a simple negative ion polymerization scheme was proposed to solve the problem of negative polysilicon hydride ion formation in a power-modulated rf silane plasma.
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Negative-Ion Mass-Spectra and Particulate Formation in Radio-Frequency Silane Plasma Deposition Experiments
TL;DR: In this paper, negative ions were only observed over a limited range of power modulation frequency which corresponds to particle-free plasma conditions, and the importance of negative ions regarding particulate formation was demonstrated and commented upon.
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Diagnostics of particle genesis and growth in RF silane plasmas by ion mass spectrometry and light scattering
TL;DR: In this paper, particle genesis and growth in RF silane plasmas by ion mass spectrometry and light scattering was detected by ion-mass spectrometer and light-scattering.
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Negative hydrogenated silicon ion clusters as particle precursors in RF silane plasma deposition experiments
TL;DR: In this paper, stable negative ions containing up to sixteen silicon atoms have been measured by mass spectrometry in RF power-modulated silane plasmas for amorphous silicon deposition.