Journal ArticleDOI
Negative-Ion Mass-Spectra and Particulate Formation in Radio-Frequency Silane Plasma Deposition Experiments
TLDR
In this paper, negative ions were only observed over a limited range of power modulation frequency which corresponds to particle-free plasma conditions, and the importance of negative ions regarding particulate formation was demonstrated and commented upon.Abstract:
Negative ions have been clearly identified in silane rf plasmas used for the deposition of amorphous silicon. Mass spectra were measured for monosilicon up to pentasilicon negative ion radical groups in power‐modulated plasmas by means of a mass spectrometer mounted just outside the glow region. Negative ions were only observed over a limited range of power modulation frequency which corresponds to particle‐free plasma conditions. The importance of negative ions regarding particulate formation is demonstrated and commented upon.read more
Citations
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Journal ArticleDOI
Nonthermal Plasma Synthesis of Nanocrystals: Fundamental Principles, Materials, and Applications
Uwe Kortshagen,R. Mohan Sankaran,Rui N. Pereira,Rui N. Pereira,Steven L. Girshick,Jeslin J. Wu,Eray S. Aydil +6 more
TL;DR: The fundamentals of nanocrystal formation in plasmas are discussed, practical implementations of plasma reactors are reviewed, the materials that have been produced with nonthermal plAsmas and surface chemistries that have be developed are surveyed, and an overview of applications of plasma-synthesized nanocrystals is provided.
Journal ArticleDOI
Nonthermal plasma synthesis of semiconductor nanocrystals
TL;DR: In this article, the important fundamental mechanisms of nanocrystal formation in plasmas, reviews the range of synthesis approaches reported in the literature and discusses some of the potential applications of plasma-synthesized semiconductor nanocrystals.
Journal ArticleDOI
The physics and chemistry of dusty plasmas
TL;DR: An overview of the most recent experimental and modelling efforts on powder formation in reactive plasmas is given in this paper, where particle charging and charge fluctuations regarding the particle agglomeration is emphasised.
Journal ArticleDOI
Investigations of CH4, C2H2 and C2H4 dusty RF plasmas by means of FTIR absorption spectroscopy and mass spectrometry
TL;DR: In this paper, a combination of IR absorption spectroscopy and mass spectrometry has been applied to dusty radiofrequency (RF) plasmas in methane, acetylene and ethylene.
Journal ArticleDOI
Dusty plasma formation: Physics and critical phenomena. Theoretical approach
TL;DR: In this article, the particle growth is considered in an analytical model as a chain of negative ion molecular reactions, stimulated by vibrational excitation, and a limitation of first generation particle size is explained as well as the strong temperature effect on cluster growth.
References
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Journal ArticleDOI
A model for the discharge kinetics and plasma chemistry during plasma enhanced chemical vapor deposition of amorphous silicon
TL;DR: In this article, a model for the plasma enhanced chemical vapor deposition of amorphous hydrogenated silicon (a•Si:H) in rf and dc discharges is presented.
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Frequency effects in silane plasmas for plasma enhanced chemical vapor deposition
TL;DR: In this paper, the authors compared the excitation frequency in radio-frequency (RF) plasmas with the 13.56 MHz industrial frequency in the same reactor and presented a comparative study of key discharge parameters such as deposition rates, plasma uniformity, ion impact energy, power transfer efficiency, and powder formation.
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Measurements of particle size kinetics from nanometer to micrometer scale in a low‐pressure argon‐silane radio‐frequency discharge
TL;DR: In this paper, the time evolution of the size of particles produced in a silane-argon low pressure radiofrequency discharge has been determined in the nanometer to the micrometer range using transmission electron microscopy.
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Effects of low‐frequency modulation on rf discharge chemical vapor deposition
TL;DR: In this paper, low frequency square wave modulation of a rf discharge in silane diluted with a rare gas brought about an improvement in the deposition rate of amorphous hydrogenated silicon films and in the film quality as well as a drastic suppression of powder concentration in the discharge space.
Journal ArticleDOI
Glow-discharge sheath electric fields: Negative-ion, power, and frequency effects.
TL;DR: Using Stark-mixed laser-induced fluorescence, space-time--resolved maps of sheath electric fields in discharges through BCl and Ar, it is argued that different ratios of negative-ion to electron density in the plasma and sheath are responsible for double-layer formation at the plasma-sheath boundary.