J
Ji Chel Bea
Researcher at Tohoku University
Publications - 11
Citations - 94
Ji Chel Bea is an academic researcher from Tohoku University. The author has contributed to research in topics: Nanodot & Non-volatile memory. The author has an hindex of 6, co-authored 11 publications receiving 83 citations.
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Journal ArticleDOI
Self-Assembly of Chip-Size Components with Cavity Structures: High-Precision Alignment and Direct Bonding without Thermal Compression for Hetero Integration
Takafumi Fukushima,T. Konno,E. Iwata,Risato Kobayashi,Toshiya Kojima,Mariappan Murugesan,Ji Chel Bea,Kang-Wook Lee,Tetsu Tanaka,Mitsumasa Koyanagi +9 more
TL;DR: New surface mounting and packaging technologies, using self-assembly with chips having cavity structures, were investigated for three-dimensional (3D) and hetero integration of complementary metal-oxide semiconductors (CMOS) and microelectromechanical systems (MEMS).
Journal ArticleDOI
New magnetic nanodot memory with FePt nanodots
Cheng Kuan Yin,Mariappan Murugesan,Ji Chel Bea,Mikihiko Oogane,Takafumi Fukushima,Tetsu Tanaka,Shozo Kono,Seiji Samukawa,Mitsumasa Koyanagi +8 more
TL;DR: In this article, a new magnetic nanodot (MND) memory with FePt nanodots was proposed, which was successfully fabricated by self-assembled Nanodot deposition (SAND).
Journal ArticleDOI
New magnetic flash memory with FePt magnetic floating gate
Cheng Kuan Yin,Ji Chel Bea,Youn Gi Hong,Takafumi Fukushima,Masanobu Miyao,Kenji Natori,Mitsumasa Koyanagi +6 more
TL;DR: In this article, an FePt magnetic floating gate with a high coercivity was successfully fabricated by DC magnetron sputtering with rapid thermal annealing, and the fundamental characteristics of the magnetic flash memory were confirmed using magnetic metal oxide semiconductor (MOS) capacitor devices and magnetic tunneling diode (MTD) devices.
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Oxide-Oxide Thermocompression Direct Bonding Technologies with Capillary Self-Assembly for Multichip-to-Wafer Heterogeneous 3D System Integration.
Takafumi Fukushima,H. Hashiguchi,Hiroshi Yonekura,Hisashi Kino,Mariappan Murugesan,Ji Chel Bea,K. W. Lee,Tetsu Tanaka,Mitsumasa Koyanagi +8 more
TL;DR: In this study, chemical mechanical polish-treated oxide formed by plasma-enhanced chemical vapor deposition (PE-CVD) as a MCtW bonding interface was mainly employed, and in addition, wafer-to-wafer thermocompression direct bonding was also used for comparison.
Journal ArticleDOI
Cell characteristics of a multiple alloy nano-dots memory structure
TL;DR: In this article, a multiple alloy metal nano-dots memory using Fowler-Nordheim (FN) tunneling was investigated in order to confirm its structural possibility for future flash memory.