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Ludvik Martinu

Researcher at École Polytechnique de Montréal

Publications -  314
Citations -  9653

Ludvik Martinu is an academic researcher from École Polytechnique de Montréal. The author has contributed to research in topics: Thin film & Microstructure. The author has an hindex of 48, co-authored 313 publications receiving 8645 citations. Previous affiliations of Ludvik Martinu include Heinrich Hertz Institute & École Polytechnique.

Papers
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Journal ArticleDOI

Optical and tribomechanical stability of optically variable interference security devices prepared by dual ion beam sputtering

TL;DR: A significant role of the substrate material, of the interfaces, and of the nature and microstructure of the deposited films in long term stability under everyday application conditions is underline.
Journal ArticleDOI

The Adhesion of Evaporated Copper to Dow Cyclotene 3022®, Determined by Microscratch Testing

TL;DR: In this article, low pressure N2 plasma and Ar+ treatments and the use of a Ti interlayer were applied to Dow Cyclotene 3022®, a low permittivity polymer.
Book ChapterDOI

Synthesis of thin films and coatings by high power impulse magnetron sputtering

TL;DR: In this paper, the fundamental discharge physics discussed in the previous chapters are used to show how the HiPIMS process parameters can be adjusted to control film growth and thereby tune film properties including hardness, refractive index, and residual stress.
Proceedings ArticleDOI

Surface-charging behavior of plasma-treated polymer films

TL;DR: In this paper, the Teflon/sup TM/homo- and copolymers TFE, FEP, PFA, MFA, AF, and PVDF-TFE were treated with a microwave plasma in hydrogen or argon and charged with a point-to-grid corona.
Journal ArticleDOI

Fabrication of buried waveguides in planar silica films using a direct CW laser writing technique

TL;DR: In this article, a CW CO 2 laser ablation technique is used to form buried waveguides in planar silica films and the refractive index distribution of these structures is measured using the reflectance of a focussed spot from the surface of the films.