L
Ludvik Martinu
Researcher at École Polytechnique de Montréal
Publications - 314
Citations - 9653
Ludvik Martinu is an academic researcher from École Polytechnique de Montréal. The author has contributed to research in topics: Thin film & Microstructure. The author has an hindex of 48, co-authored 313 publications receiving 8645 citations. Previous affiliations of Ludvik Martinu include Heinrich Hertz Institute & École Polytechnique.
Papers
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Journal ArticleDOI
Improvement of flow strength and scratch resistance of Ti/Cu nanocrystalline metal multilayer thin films by tailoring layer thickness and modulation ratio
Haoruo Zhou,Li Chang,Kunkun Fu,Hao Huang,Ranming Niu,Xiaozhou Liao,Leigh R Sheppard,Laurel George,Ludvik Martinu +8 more
TL;DR: In this article, a group of nanocrystalline Ti/Cu multilayer thin films were fabricated using direct current magnetron sputtering with different layer thicknesses, namely 250, 100, 50, 25 and 5 nm.
Proceedings ArticleDOI
Miniaturized inorganic electret layers
TL;DR: In this paper, a micromachined electret condenser microphone with SiO/sub 2/Si/sub 3/N/sub 4/ single and double layers and SiON layers are investigated in terms of chargeability and long-term charge-stability.
Journal ArticleDOI
High quality boron carbon nitride/ZnO-nanorods p-n heterojunctions based on magnetron sputtered boron carbon nitride films
Jincheng Qian,Jincheng Qian,S. K. Jha,B. Q. Wang,Emil V. Jelenković,I. Bello,Jolanta-Ewa Klemberg-Sapieha,Ludvik Martinu,Wenjun Zhang +8 more
TL;DR: In this article, Boron carbon nitride (BCN) films were synthesized on Si (100) and fused silica substrates by radiofrequency magnetron sputtering from a B4C target in an Ar/N2 gas mixture.
Journal ArticleDOI
Hard AlN films prepared by low duty cycle magnetron sputtering and by other deposition techniques
Jiří Kohout,Jincheng Qian,Thomas Schmitt,Richard Vernhes,Oleg Zabeida,Jolanta E. Klemberg-Sapieha,Ludvik Martinu +6 more
TL;DR: In this paper, a reactive low duty cycle pulsed direct current magnetron sputtering (LDMS) process was employed to deposit AlN films on glass and silicon substrates.
Journal ArticleDOI
Degradation mechanism of protected ultrathin silver films and the effect of the seed layer
TL;DR: In this paper, the Kirkendall effect was used to characterize the degradation of protected silver thin films in a reactive oxidizing environment, and a solution to reduce the degradation was proposed.