L
Ludvik Martinu
Researcher at École Polytechnique de Montréal
Publications - 314
Citations - 9653
Ludvik Martinu is an academic researcher from École Polytechnique de Montréal. The author has contributed to research in topics: Thin film & Microstructure. The author has an hindex of 48, co-authored 313 publications receiving 8645 citations. Previous affiliations of Ludvik Martinu include Heinrich Hertz Institute & École Polytechnique.
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Study of TiO2 film growth mechanisms in low-pressure plasma by in situ real-time spectroscopic ellipsometry
TL;DR: In this article, the initial stages of growth of TiO2 films prepared by plasma-enhanced chemical vapor deposition on plasma pre-oxidized c-Si were investigated using in situ real-time spectroscopic ellipsometry.
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Pulsed radio frequency plasma deposition of a-SiNx:H alloys: Film properties, growth mechanism, and applications
TL;DR: In this paper, a fabrication process of a-SiNx:H alloys by pulsing the radio frequency (rf) signal in a low pressure plasmaenhanced chemical vapor deposition (PECVD) system was proposed.
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Structural, mechanical, tribological, and corrosion properties of a-SiC:H coatings prepared by PECVD
Srinivasan Guruvenket,M. Azzi,Duanjie Li,Jerzy A. Szpunar,Ludvik Martinu,Jolanta E. Klemberg-Sapieha +5 more
TL;DR: Amorphous hydrogenated silicon-carbide (a-SiC:H) coatings appear very attractive due to their superior optical and mechanical properties and chemical inertness as mentioned in this paper.
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Temperature dependence of the surface plasmon resonance of Au/SiO2 nanocomposite films
Dan Dalacu,Ludvik Martinu +1 more
TL;DR: In this article, the optical response of Au/SiO2 nanocomposite films at temperatures spanning the transition to the liquid state has been measured and it was shown that the change in the optical constants of gold from those corresponding to the crystalline material to those of the liquid occurs gradually and at temperatures below the bulk melting point.
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Quaternary hard nanocomposite TiCxNy/SiCN coatings prepared by plasma enhanced chemical vapor deposition
TL;DR: In this article, the properties of hard thin film materials such as TiN, SiN 1.3 and CN x have been systematically studied, while systematically studying quaternary thin films prepared by plasma enhanced chemical vapor deposition (PECVD).