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Ludvik Martinu

Researcher at École Polytechnique de Montréal

Publications -  314
Citations -  9653

Ludvik Martinu is an academic researcher from École Polytechnique de Montréal. The author has contributed to research in topics: Thin film & Microstructure. The author has an hindex of 48, co-authored 313 publications receiving 8645 citations. Previous affiliations of Ludvik Martinu include Heinrich Hertz Institute & École Polytechnique.

Papers
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Design and fabrication of stress-compensated optical coatings: Fabry-Perot filters for astronomical applications.

TL;DR: An optimization tool for the design of optical filters taking into account both the optical and mechanical properties of the substrate and of the individual deposited layers is proposed.
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Adhesion improvement of plasma-deposited silica thin films on stainless steel substrate studied by x-ray photoemission spectroscopy and in situ infrared ellipsometry

TL;DR: In this paper, an x-ray photo-emission spectroscopy (XPS) and in situ IR ellipsometry performed on very thin films (≈30 A) was performed on stainless steel, and the removal of adsorbed hydrocarbons on the metallic surface by all plasma treatments.
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Tribological properties of duplex treated TiN/TiCN coatings on plasma nitrided PH15-5 steel

TL;DR: In this article, the thickness of the compound layer fabricated by a single mode plasma is ∼ 5μm, while that fabricated by dual-frequency mode plasma was ∼ 35μm.
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Growth and properties of high index Ta2O5 optical coatings prepared by HiPIMS and other methods

TL;DR: In this article, the effect of specific deposition conditions on the growth characteristics, surface morphology, as well as on the optical and mechanical properties of amorphous Ta 2 O 5 films was investigated.
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Active metameric security devices using an electrochromic material.

TL;DR: A design methodology for metameric filters based on the luminous efficiency curve of the human eye results in filters with a lower number of layers and hence lower fabrication costs, and with a higher color difference sensitivity under various illuminants and for nonstandard observers.