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Ludvik Martinu

Researcher at École Polytechnique de Montréal

Publications -  314
Citations -  9653

Ludvik Martinu is an academic researcher from École Polytechnique de Montréal. The author has contributed to research in topics: Thin film & Microstructure. The author has an hindex of 48, co-authored 313 publications receiving 8645 citations. Previous affiliations of Ludvik Martinu include Heinrich Hertz Institute & École Polytechnique.

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Tribological properties of CrSiN-coated 301 stainless steel under wet and dry conditions

TL;DR: In this article, a linear reciprocating ball-on-flat tribometer was used to measure the tribological properties of CrSiN coatings under both dry and wet conditions.
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Mass-resolved ion energy distributions in continuous dual mode microwave/radio frequency plasmas in argon and nitrogen

TL;DR: In this paper, a dual-mode microwave/radio frequency (MW/rf) plasma system was used to investigate the effect of plasma parameters (gas type and pressure, self-bias voltage, for example) on the energy and flux of ionic species arriving at the specimen surface.
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Onset of shadowing-dominated growth in glancing angle deposition

TL;DR: In this paper, shadowing instabilities can dramatically alter the very early stages of growth of amorphous thin films on nominally smooth surfaces, and the porosity and morphological evolutions of thin films grown under conditions of normal and glancing incidences of the vapor flux.
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Mechanical and tribological properties of dual-frequency plasma- deposited diamond-like carbon

TL;DR: In this paper, the properties of hydrogenated amorphous carbon (a-C:H) films with diamond-like properties have been studied and correlated with the films' microstructure, and it is shown that the mechanical and tribological properties strongly depend on the amount of unbonded hydrogen in the films.
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Pulse management in high power pulsed magnetron sputtering of niobium

TL;DR: In this article, a comparison of high power pulsed magnetron sputtering is performed on a niobium target operated in the same reactor using two commercially available power supplies: (i) a shorter (200-μs) square voltage pulse generator permitting higher cathode voltage values, and (ii) a modulated pulse power generator with longer (800-300) custom-shaped pulses.