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Ludvik Martinu

Researcher at École Polytechnique de Montréal

Publications -  314
Citations -  9653

Ludvik Martinu is an academic researcher from École Polytechnique de Montréal. The author has contributed to research in topics: Thin film & Microstructure. The author has an hindex of 48, co-authored 313 publications receiving 8645 citations. Previous affiliations of Ludvik Martinu include Heinrich Hertz Institute & École Polytechnique.

Papers
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Tribological properties of duplex Cr–Si–N coatings on SS410 steel

TL;DR: In this article, the effect of silicon concentration on the tribological properties of the Cr-Si-N coatings on SS410 steel substrates was studied, and it was found that the coating containing 2.3% of Si, corresponding to the solubility limit, exhibits the best mechanical and tribological performance: the wear rate of the SS410 substrate has been reduced by a factor of 500.
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Single-material inhomogeneous optical filters based on microstructural gradients in plasma-deposited silicon nitride.

TL;DR: Besides the attractive optical features of such single-material rugate filters, it is found that the mechanical resistance of inhomogeneous films is superior to that of multilayer systems.
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HiPIMS-deposited thermochromic VO2 films with high environmental stability

TL;DR: In this paper, a comparative study of the environmental stability of HiPIMS and radio frequency magnetron sputtered (RFMS) thermochromic vanadium dioxide thin films in a highly oxidizing environment was performed.
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Angle‐resolved XPS study of plasma‐treated teflon PFA surfaces

TL;DR: In this article, Teflon PFA (polytetrafluoroethylene-co-perfluoroalkoxy vinyl ether) was treated by a low-pressure microwave (2.45 GHz) plasma in O2, N2, H2, He and their mixtures.
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Anisotropic nonlinear optical absorption of gold nanorods in a silica matrix

TL;DR: In this paper, the nonlinear absorption coefficient for the films containing gold nanospheres was measured by Z-scan and P-scan techniques, and it was found to be isotropic and equal to −4.8 × 10−2 cm/W.