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T. Remmele

Researcher at Institut für Kristallzüchtung

Publications -  43
Citations -  1474

T. Remmele is an academic researcher from Institut für Kristallzüchtung. The author has contributed to research in topics: Quantum well & Molecular beam epitaxy. The author has an hindex of 18, co-authored 38 publications receiving 1362 citations.

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Systematic experimental and theoretical investigation of intersubband absorption in Ga N ∕ Al N quantum wells

TL;DR: In this paper, the authors studied the electronic confinement in hexagonal (1.33 -1.91)-1.5-1.3-μm hexagonal quantum well by means of high-resolution x-ray diffraction and transmission electron microscopy.
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Epitaxial stabilization of pseudomorphic α-Ga2O3on sapphire (0001)

TL;DR: In this paper, a three-monolayer-thick pseudomorphically grown layer of trigonal α-Ga2O3 at the interface between the c-plane sapphire substrate and the β-Ga 2O3 independent of the growth method is investigated.
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Effect of annealing on the In and N distribution in InGaAsN quantum wells

TL;DR: In this article, the influence of annealing on compositional fluctuations in InGaAsN quantum wells by means of composition-sensitive high-resolution transmission electron microscopy and photoluminescence was analyzed.
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Si-doped GaN /AlN quantum dot superlattices for optoelectronics at telecommunication wavelengths

TL;DR: In this article, the authors report on the controlled growth by molecular beam epitaxy of 20-period Si-doped GaN∕AlN quantum dot (QD) superlattices, in order to tailor their intraband absorption within the 1.3-1.55μm telecommunication spectral range.