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Tai-Yuan Wu

Researcher at Industrial Technology Research Institute

Publications -  28
Citations -  1018

Tai-Yuan Wu is an academic researcher from Industrial Technology Research Institute. The author has contributed to research in topics: Resistive random-access memory & Non-volatile memory. The author has an hindex of 14, co-authored 28 publications receiving 966 citations. Previous affiliations of Tai-Yuan Wu include Minghsin University of Science and Technology.

Papers
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Journal ArticleDOI

Low-Power and Nanosecond Switching in Robust Hafnium Oxide Resistive Memory With a Thin Ti Cap

TL;DR: In this paper, the memory performance of hafnium oxide (HfOx)-based resistive memory containing a thin reactive Ti buffer layer can be greatly improved due to the excellent ability of Ti to absorb oxygen atoms from the HfOx film after post-metal annealing.
Proceedings Article

A 5ns fast write multi-level non-volatile 1 K bits RRAM memory with advance write scheme

TL;DR: A 1-Kb HfO2 based RRAM for high speed nonvolatile memory application is proposed, which includes a 1T1R RRAM cell and a voltage write circuit, which limit the current through the memory cell.
Journal ArticleDOI

An Ultrathin Forming-Free $\hbox{HfO}_{x}$ Resistance Memory With Excellent Electrical Performance

TL;DR: In this paper, a 3-nm-thick HfOx resistive memory with stable bipolar resistance switching by initial positive or negative voltage sweep has been demonstrated, which exhibits high speed (~10 ns), low operation voltages ( 106 cycles), good nonvolatile property (500 min at 85 °C), and 2-b switching per cell per cell.
Patent

Resistive random access memory and method for fabricating the same

TL;DR: In this article, a resistive random access memory and a method for fabricating the same are provided, which includes forming a bottom electrode on a substrate, forming a metal oxide layer on the bottom electrode, forming an oxygen atom gettering layer, and forming a first top electrode sub-layer on the oxygen atom gettingtering layer.