T
Th. Gross
Researcher at Bundesanstalt für Materialforschung und -prüfung
Publications - 20
Citations - 801
Th. Gross is an academic researcher from Bundesanstalt für Materialforschung und -prüfung. The author has contributed to research in topics: X-ray photoelectron spectroscopy & Spectroscopy. The author has an hindex of 12, co-authored 20 publications receiving 743 citations.
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Journal ArticleDOI
Chemical and microstructural changes induced by friction and wear of brakes
TL;DR: In this paper, the chemical and microstructural changes occurring during braking simulation tests at the surface of a conventional brake pad material were investigated mainly by scanning and transmission electron microscopy and surface analytical techniques.
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An XPS analysis of different SiO2 modifications employing a C 1s as well as an Au 4f7/2 static charge reference
TL;DR: In this article, four different silica modifications (thermally grown SiO2, quartz glass, silicalite and silica gel) have been investigated by XPS and the results confirm that different modifications of silica give substantially the same relevant binding energy (BE) in XPS.
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Critical Review of the Current Status of Thickness Measurements for Ultrathin SiO2 on Si, Part V: Results of a CCQM Pilot Study
Martin P. Seah,Steve J. Spencer,Farid Bensebaa,I Vickridge,H.-U. Danzebrink,Michael Krumrey,Th. Gross,W Oesterle,Elke Wendler,Bernd Rheinländer,Yasushi Azuma,Isao Kojima,Noboru Suzuki,Mineharu Suzuki,Shigeo Tanuma,D. W. Moon,Hansuek Lee,H Cho,H Y. Chen,Andrew T. S. Wee,Thomas Osipowicz,J S. Pan,W A. Jordaan,Roland Hauert,Ulrich E. Klotz,C. van der Marel,Marcel A. Verheijen,Y. Tamminga,Chris Jeynes,Paul Bailey,S Biswas,U Falke,Nhan V. Nguyen,Deane Chandler-Horowitz,James R. Ehrstein,D Muller,Joseph A. Dura +36 more
TL;DR: In this paper, a study was carried out for the measurement of ultrathin SiO on (100) and (111) orientation silicon wafer in the thickness range 1.5-8 nm.
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Improvement in polymer adhesivity by low and normal pressure plasma surface modification
TL;DR: In this article, the results of polymer surface modification employing three different types of plasma jet (arc, sparc and corona) are compared with those of d.c. and r.f. glow discharge modification.
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X-ray photoelectron spectroscopy and near-edge X-ray-absorption fine structure of C60 polymer films
TL;DR: In this article, core-level and valence-band X-ray photoelectron spectroscopy (XPS) and carbon near-edge Xray-absorption-fine structure (NEXAFS) results of plasma-polymerized C60 were reported.