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Thomas Fromherz

Researcher at Johannes Kepler University of Linz

Publications -  164
Citations -  8910

Thomas Fromherz is an academic researcher from Johannes Kepler University of Linz. The author has contributed to research in topics: Quantum dot & Quantum well. The author has an hindex of 30, co-authored 160 publications receiving 8443 citations.

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Direct determination of ultrafast intersubband hole relaxation times in voltage biased SiGe quantum wells by a density matrix interpretation of femtosecond resolved photocurrent experiments

TL;DR: In this paper, the authors reported the quantitative and direct determination of hole intersubband relaxation times in a voltage biased SiGe heterostructure using density matrix calculations applied to a four-level system in order to interpret photocurrent (PC) pump-pump experiments.
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Bandstructure analysis of strain compensated Si/SiGe quantum cascade structures

TL;DR: In this article, a set of structural parameters, determined with high accuracy in combination with polarization resolved intersubband absorption and photoluminescence spectra deduced from the same set of samples, were compared with k.p calculations.
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Anisotropic remastering for reducing feature sizes on UV nanoimprint lithography replica molds

TL;DR: An approach that uses existing nanoimprint molds and reduces the size of the resulting features significantly via a remastering process utilizing the anisotropic etchant tetramethylammonium hydroxide and a mold casting step is presented.
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3D SiGe QUANTUM DOT CRYSTALS: STRUCTURAL CHARACTERIZATION AND ELECTRONIC COUPLING

TL;DR: In this article, the growth of SiGe quantum dot crystals is described, which are realized by depositing Ge on a two-dimensional, pit-patterned Si substrate and subsequent growth of the Si spacer and Ge island layers.
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Recent Results on the Road to a SiGe Quantum Cascade Laser

TL;DR: In this paper, the Si-based quantum cascade laser is implemented and the primary challenges in implementing a Si based quantum cascade was discussed, with an interface roughness of < 0.4 nm and the upper state lifetime τnr was ~ 100 fs.