Todd Bailey

TL;DR: In this article, a template is created on a standard mask blank by using the patterned chromium as an etch mask to produce high-resolution relief images in the quartz.

TL;DR: In this paper, an automated tool for step and flash imprint lithography was constructed to allow defect studies by making multiple imprints on a 200 mm wafer, and the imprint templates for this study were treated with a low surface energy, self-assembled monolayer to ensure selective release at the template-etch barrier interface.

TL;DR: In this article, imprint lithography templates are used to form an imprinted layer in a light curable liquid disposed on a substrate, and during use, the template may be disposed within a template holder.

TL;DR: In this paper, a 1 in. diameter curved surface with a 46 mm radius of curvature was demonstrated with step and flash imprint lithography (SFIL) using templates patterned by ion beam proximity printing (IBP).

TL;DR: Inspection of an imprint template before and after imprinting revealed that the template actually becomes cleaner with imprinting, and visual inspection of multiple imprints did not reveal any systematic generation or propagation of defects.