Z
Zhiping Yu
Researcher at Stanford University
Publications - 103
Citations - 2581
Zhiping Yu is an academic researcher from Stanford University. The author has contributed to research in topics: Gate oxide & MOSFET. The author has an hindex of 29, co-authored 103 publications receiving 2516 citations. Previous affiliations of Zhiping Yu include Tsinghua University.
Papers
More filters
Journal ArticleDOI
The impact of high-/spl kappa/ gate dielectrics and metal gate electrodes on sub-100 nm MOSFETs
Baohong Cheng,Min Cao,R. Rao,A. Inani,P. Vande Voorde,Wayne Greene,J.M.C. Stork,Zhiping Yu,P.M. Zeitzoff,Jason C. S. Woo +9 more
TL;DR: In this paper, the potential impact of high/spl kappa/ gate dielectrics on device short-channel performance is studied over a wide range of dielectric permittivities using a two-dimensional (2D) simulator implemented with quantum mechanical models.
Journal ArticleDOI
A noise optimization technique for integrated low-noise amplifiers
TL;DR: In this article, the authors proposed a noise optimization method for low-noise amplifier (LNA) designs based on measured fournoise parameters and two-port noise theory, which can achieve near NF/sub min/ by choosing an appropriate device geometry along with an optimal bias condition.
Journal ArticleDOI
Impact of gate direct tunneling current on circuit performance: a simulation study
TL;DR: In this paper, the influence of gate direct tunneling current on gate oxide MOS (1.1 nm/spl les/t/sub ox/spl −1.5 nm, L/sub g/=50-70 nm) circuits has been studied based on detailed simulations.
Journal ArticleDOI
First-principles investigation on bonding formation and electronic structure of metal-graphene contacts
TL;DR: In this article, a first-principles calculation of contacts between graphene and 12 different metals was performed, and it was shown that there exist two types of contacts depending on the strength of interaction between d-orbitals in metals and pz-orbital in graphene.
Journal ArticleDOI
Density-gradient analysis of MOS tunneling
TL;DR: In this article, the density-gradient description of quantum transport is applied to the analysis of tunneling phenomena in ultrathin oxide MOS capacitors and two new refinements to density gradient theory are introduced, relating to the treatment of Shockley-Read-Hall recombination and the modification of the tunneling boundary conditions to account for the semiconductor bandgap.