Altran

About: Altran is a company organization based out in Neuilly-sur-Seine, France. It is known for research contribution in the topics: Software development & Formal verification. The organization has 488 authors who have published 512 publications receiving 6395 citations.

An innovative algorithm for panoramic representation in observation systems

Abstract: This document presents the study and test carried out for the development of an innovative algorithm designed to create a panoramic representation of the scene scanned by observation systems operating with passive sensors. The purpose of the algorithm is to represent 360° of scene using staring sensors mounted on stabilized or semi-stabilized platforms, without requirements on video output, both in terms of the transmission format and in terms of frame rate. The algorithm is real-time and does not require step-and-stare technique or special systems to scan the scene. The architecture of the algorithm requires a very low computational cost for the electronics contained in a Multi-Functional Display (MDP) used in defense applications. The algorithm has been implemented and tested on the JANUS NAVAL system, where the results were very satisfactory. Today, a patent is pendent.

Development of a Simplied Helicopter Model for Piloted Training Simulation

Abstract: qualication standards for the simulator, a series of features are added to the baseline model so as to deal with all ight conditions possibly encountered during vehicle operation. These additional features include engine model and governor, a simple undercarriage and ground{eect model, the representation of vortex ring state and icing phenomena. The architecture of both hardware and software for the simulator is presented and discussed.

Untersuchung der Zahngesundheit der Schüler in Bayern

Abstract: Die Bayerischen Landesarbeitsgemeinschaft Zahngesundheit e.V. (LAGZ) untersucht alle funf Jahre die Zahngesundheit bayerischer Schulkinder. Fur das Jahr 2009 war eine erneute sogenannte epidemiologische Studie geplant. Dabei sollten die Altersgruppen der 6/7jahrigen, der 12jahrigen und der 15jahrigen Schuler in Regelschulen (d.h. Grund-, Haupt-, Realschulen und Gymnasien) untersucht werden. Diese Untersuchungen funktionierten praktisch so, dass mehrere Teams von Zahnarzten an ausgewahlte Schulen fuhren und dort vorher festgelegte Klassen untersuchten.

Numerical Analysis of Renewable Generation Variability for Energy Storage Smoothing Applications

Abstract: With the increasing penetration of Wind Turbine (WT) and Photovoltaic (PV) generation, there is a rising concern about the problems associated to power variability and how the system can be operated to mitigate its effects. Energy Storage Systems (ESSs) can be used to limit or smooth variability while maximizing the generation of renewable energy. However, existing references to the problems caused by power variability are not clear on the technical requirements of smoothing algorithms. This paper reviews existing information, including academic research, technical reports and international grid codes, on the problems caused by power variability and how they can be numerically evaluated in terms of severity, probability and time range of variations. The effects in power variability of smoothing algorithms according to existing evaluation methods is analyzed in a hybrid plant case study.

Projection exposure apparatus for semiconductor lithography with increased thermal robustness

Abstract: A projection exposure apparatus for semiconductor lithography includes: a light source for generating optical used radiation by which structures arranged on a reticle can be imaged onto a wafer; a plurality of optical elements for guiding and manipulating the used radiation; and a plurality of position sensors for determining the position of at least some of the optical elements. At least some of the position sensors are arranged on a measurement structure that is at least partially decoupled mechanically and/or thermally from the further components of the projection exposure apparatus. The measurement structure has at least two mechanically decoupled substructures. The first substructure has a lower coefficient of thermal expansion than the second substructure. The second substructure has a greater stiffness than the first substructure.