An XUV optics beamline at BESSY II
Andrey Sokolov,F. Eggenstein,Alexei Erko,Rolf Follath,S. Künstner,M. Mast,J.-S. Schmidt,F. Senf,Frank Siewert,Thomas Zeschke,Franz Schäfers +10 more
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The collimated plane grating monochromator (PGM-) beamline at a bending magnet is setup at the BESSY-II synchrotron radiation facility within the framework of the blazed-grating production facility as mentioned in this paper.Abstract:
The design for a new XUV-Optics Beamline is presented. The collimated plane grating monochromator (PGM-) beamline at a bending magnet is setup at the BESSY-II synchrotron radiation facility within the framework of the blazed-grating production facility. Coupled to a versatile four-circle (ten ax es) UHV- reflectometer as a permanent end station the whole setup is dedicated to at-wavelength characterizati on and calibration of the in-house produced precision gratings and novel nano-optical devices as well as mirrors, multila yered systems etc. It is also open to exte rnal projects employing reflectometry, spectroscopy or scattering techniques. According to its purpose, this beamline has specific features, such as: very high spectral purity, provided by two independent high order suppression systems, an advanced aperture system for suppression of stray light and scattered radiation, a broad energy range between 10 eV and 2000 eV, small beam divergence and spot size on the sample. Thus this Optics Beamline will become a powerful metrology tool for reflectivity measurements in s- or p-polarisation geometry with linearly or elliptically polarized light on real optics up to 360 mm length and 4 kg weight. Keywords: At-wavelength metrology, UV, EUV, VUV, XUV, reflection gratings, reflectometry, polarimetry, synchrotron instrumentationread more
Citations
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Journal ArticleDOI
The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II.
Franz Schäfers,P. Bischoff,F. Eggenstein,Alexei Erko,A. Gaupp,S. Künstner,M. Mast,J.-S. Schmidt,F. Senf,Frank Siewert,Andrey Sokolov,Th. Zeschke +11 more
TL;DR: A new optics beamline and a versatile 11-axes UHV-reflectometer for at-wavelength characterization of real life-sized UV- and XUV-reflection gratings and other (nano-) optical elements has been set up and is in operation at BESSY-II.
Journal ArticleDOI
Gratings for synchrotron and FEL beamlines: a project for the manufacture of ultra-precise gratings at Helmholtz Zentrum Berlin
Frank Siewert,Bernd Löchel,Jana Buchheim,F. Eggenstein,Alexander Firsov,Grzegorz Gwalt,O. Kutz,St. Lemke,B. Nelles,I. Rudolph,Franz Schäfers,Tino Seliger,F. Senf,Andrey Sokolov,Ch. Waberski,J. Wolf,Thomas Zeschke,I. Zizak,Rolf Follath,Rolf Follath,Thomas Arnold,F. Frost,F. Pietag,Alexei Erko +23 more
TL;DR: Establishing a facility for the production of gratings for synchrotron and free-electron laser applications is reported.
Journal ArticleDOI
At-wavelength metrology facility for soft X-ray reflection optics
Andrey Sokolov,P. Bischoff,F. Eggenstein,Alexei Erko,A. Gaupp,S. Künstner,M. Mast,J.-S. Schmidt,F. Senf,Frank Siewert,Th. Zeschke,Franz Schäfers +11 more
TL;DR: Most recent commissioning data of the beamline is presented and their correlation with initial beamline design calculations is shown, which determine the quality of the measurements such as high-order suppression and stray light behavior.
Journal ArticleDOI
Efficient high-order suppression system for a metrology beamline.
TL;DR: The design of the instrument and its performance in suppressing high-order diffraction from the monochromator grating are described in this paper.
Journal ArticleDOI
The At-Wavelength Metrology Facility at BESSY-II
Franz Schäfers,Andrey Sokolov +1 more
TL;DR: The At-Wavelength Metrology Facility at BESSY-II is dedicated to short-term characterization of novel UV, EUV and XUV optical elements, such as diffraction gratings, mirrors, multilayers and nano-optical devices like reflection zone plates as discussed by the authors.
References
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Journal ArticleDOI
Soft-x-ray polarimeter with multilayer optics: complete analysis of the polarization state of light.
Franz Schäfers,Hans Christoph Mertins,Andreas Gaupp,Wolfgang Gudat,Marcel Mertin,Ingo Packe,Frank Schmolla,Silvia Di Fonzo,G. Soullié,Werner Jark,Richard A. Walker,Xavier Le Cann,Ralf Nyholm,Mikael Eriksson +13 more
TL;DR: With these newly developed optical elements the complete polarization analysis of soft-x-ray synchrotron radiation can be extended to the water-window range from 300 to 600 eV.
BookDOI
Modern developments in X-ray and neutron optics
TL;DR: The BESSY Raytrace Program RAY (BESSIDRA) as mentioned in this paper uses RESTRAX to propagate wavefront propagation for X-ray and Neutron optical systems.
Journal ArticleDOI
Review of plane grating focusing for soft x‐ray monochromators
TL;DR: In this paper, the performance of grating and crystal monochromators is compared in the 1-2 keV photon energy range. And the performance data of a plane grating focusing condition was presented.
Journal ArticleDOI
High-resolution, high-flux, user friendly VLS beamline at the ALS for the 50–1300 eV energy region
J.H. Underwood,Eric M. Gullikson +1 more
TL;DR: A bending magnet beamline designed to operate on a third generation synchrotron light source (ALS) in the energy range 50-1300 eV was described in this paper. But the beamline was not designed for the characterization of optical elements (mirrors, gratings, multilayers, detectors etc.) but has capabilities for a wide range of measurements in other fields, in particular materials science and atomic physics.
Journal ArticleDOI
Cr/Sc multilayers for the soft-x-ray range
Franz Schäfers,Hans-Christoph Mertins,Frank Schmolla,Ingo Packe,N. N. Salashchenko,E. A. Shamov +5 more
TL;DR: The performance theoretically expected with respect to reflection/transmission and energy resolution has been confirmed experimentally and a value of 7% for the normal-incidence peak reflectance was measured as well as a pronounced minimum in transmission for certain incidence angles and energies below the respective absorption edges, indicating significant phase-shifting effects.