Journal ArticleDOI
Deposition and characterisation of Al–Cu–Fe thin films
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TLDR
In this article, multilayer thin films Al/Cu/Fe were deposited in different sequences by sputtering in a triode system and after the deposition the samples were annealed in an inert atmosphere at temperatures up to 600 °C in order to obtain a homogeneous film with the desirable composition Al 62 Cu 25 Fe 13.About:
This article is published in Thin Solid Films.The article was published on 2004-07-01. It has received 16 citations till now. The article focuses on the topics: Sputter deposition & Thin film.read more
Citations
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Journal ArticleDOI
Etching of carbon–tungsten composite with oxygen plasma
Alenka Vesel,Miran Mozetič,Peter Panjan,Nina Hauptman,M. Klanjsek-Gunde,Marianne Balat-Pichelin +5 more
TL;DR: The removal rate of carbon from amorphous graphite-tungsten composite during cleaning in oxygen plasma was studied in this paper, where the composite was prepared by sputter deposition from C and WC-targets in Ar atmosphere.
Journal ArticleDOI
Oscillating composition of Fe–W alloy thin films grown by magnetron co-sputtering
Pascale Plantin,A.L. Thomann,Pascal Brault,Pierre-Olivier Renault,S. Laaroussi,P. Goudeau,B. Boubeker,Thierry Sauvage +7 more
TL;DR: In this paper, the influence of two deposition parameters on this particular in-depth composition modulation was studied: substrate rotation rate and deposition time, and it was shown that the thickness of the elementary layers depends on the rotation rate of the substrate holder, as expected from what is reported in the literature on pure nanolayer synthesis in planar magnetron geometry.
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Surface modification of iron containing aluminum alloys by treatment with copper plasma produced with cathodic arc
Beril Çorlu,Mustafa Ürgen +1 more
TL;DR: In this paper, a new approach for modification of surfaces with the help of cathodic arc plasma and its bias voltage dependent interaction with the substrates is described, where the effect of successively applied bias voltages of −150-V and −1000-V was investigated on the resulting micro structural surface features of the alloys.
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Diffusion processes during heat treatment of Al–Cr–Fe thin films
TL;DR: In this article, the evolution of depth profiling was evaluated by Auger electron spectroscopy (AES) and was also observed by indirect methods, such as X-ray diffraction (XRD), nanoindentation and electric resistivity measurement.
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Diffusion during annealing of Al/Cu/Fe thin films
Miha Čekada,Peter Panjan,Janez Dolinšek,Janez Dolinšek,Anton Zalar,Zvonko Medunić,Milko Jakšić,Nikola Radić +7 more
TL;DR: In this article, a two-step procedure of thin film preparation is considered: deposition of a multilayer structure of individual elements and consequential annealing, and the results point out to a three-stage process as a function of rising temperature.
References
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Journal ArticleDOI
Effects of air plasma spraying parameters on the Al-Cu-Fe quasicrystalline coating layer
TL;DR: In this article, the effect of air plasma spray processing parameters on the characteristics of the Al-Cu-Fe quasicrystalline coatings was studied and significant effects of the process parameters on microstructure and subsequent mechanical properties were observed.
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Pulsed laser ablation of Al–Cu–Fe quasicrystals
TL;DR: In this article, a doubled Nd:YAG laser was used to ablate quasicrystalline Al65-Cu23-Fe12 targets and the results showed evidence of distinct ablation mechanisms which lead to different gas phase composition, as a function of the laser fluence.
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Effect of oxygen on the making of AlCuFe quasicrystalline coatings
TL;DR: In this paper, a process of making ultra thin quasicrystalline coatings with free surfaces of the AlCuFe ternary alloy was presented, whose thickness ranges from 100 to 150 nm.
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Oxidation of quasicrystalline and crystalline AlCuFe thin films in air
TL;DR: In this article, thin aluminum oxide films with thickness from 160 nm to 200 nm were exposed to air for a time interval of 4-4 1/2 h at a temperature of 400°C.
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Preparation of Al-Cu-Fe thin films by vapor deposition technique from a single source
TL;DR: In this paper, the formation of stable icosahedral Al-Cu-Fe quasicrystalline thin films by thermal vapor deposition techniques (indirect heating and e-beam heating) from a single source was reported.