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Journal ArticleDOI

Dynamic micromechanics on silicon: Techniques and devices

Kurt E. Petersen
- 01 Oct 1978 - 
- Vol. 25, Iss: 10, pp 1241-1250
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TLDR
In this paper, the authors describe fabrication procedures for constructing thin, electrostatically deflectable SiO 2 membranes on a silicon wafer in a very controllable manner, and three examples of typical applications for the micromechanical structures are discussed.
Abstract
New fabrication procedures ate described for constructing thin, electrostatically deflectable SiO 2 membranes on a silicon wafer in a very controllable manner. Performance parameters of these membranes are analyzed and three examples of typical applications for the micromechanical structures are discussed: a light modulator array, a micromechanical voltage-controlled switch, and the measurement of the mechanical properties of thin insulating films unconstrained by the substrate. Since the lifetimes of the membranes can be very long (>1010cycles), their dimensions very small (8.3 µm long, 950 A thick have been demonstrated), and the fabrication technique is simple and versatile, the potential applicability of such devices seems promising.

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Citations
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Journal ArticleDOI

Silicon as a mechanical material

TL;DR: This review describes the advantages of employing silicon as a mechanical material, the relevant mechanical characteristics of silicon, and the processing techniques which are specific to micromechanical structures.
Journal ArticleDOI

M-TEST: A test chip for MEMS material property measurement using electrostatically actuated test structures

TL;DR: In this article, a set of electrostatically actuated microelectromechanical test structures (M-Test) is proposed for measuring material properties at the wafer level during both process development and manufacturing.
Journal ArticleDOI

Electrostatic pull-in instability in MEMS/NEMS: A review

TL;DR: In this paper, a review of the pull-in phenomenon in electrostatically actuated MEMS and NEMS devices is presented, along with physical principles that have enabled fundamental insights into the pullin instability as well as pullin induced failures.
Journal ArticleDOI

Micromechanical membrane switches on silicon

TL;DR: In this paper, the authors describe the design, fabrication, operating behavior, and potential applications of voltage-controlled, micromechanical switches, which are basically extremely small, electrostatically controlled mechanical relays, typically less than 100 µm long.
Journal ArticleDOI

Pull-in voltage analysis of electrostatically actuated beam structures with fixed–fixed and fixed–free end conditions

TL;DR: In this article, a closed-form expression for the pull-in voltage of fixed-fixed beams and fixed-free beams is derived starting from the known expression of a simple lumped spring-mass system.
References
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Journal ArticleDOI

The resonant gate transistor

TL;DR: In this paper, the resonant gate transistor (RGT) is described as an electrostatically excited tuning fork employing field effect transistor readout, which can be batch-fabricated in a manner consistent with silicon technology.
Journal ArticleDOI

A Water‐Amine‐Complexing Agent System for Etching Silicon

TL;DR: In this article, the silicon etch rate has been investigated as a function of variations in both solution and material parameters, and a parallel investigation has been concerned with the etching characteristics of silicon samples coated with silicon dioxide films.
Journal ArticleDOI

Micromechanical light modulator array fabricated on silicon

TL;DR: In this article, a micromechanical device is described which consists of a thin metal-coated SiO2 membrane fabricated on an ordinary silicon wafer using techniques compatible with IC processing.
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