Evaluation of Hydrogen-Induced Blistering of Mo/Si Multilayers with a Capping Layer
Hiroaki Tomuro,Mengran Ji,Ryo Nagata,Koichiro Kouge,Tatsuya Yanagida,Masayuki Morita,Masahiko Andou,Yoshiyuki Honda,Kiichiro Uchino,Tsuyoshi Yoshitake +9 more
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TLDR
In this paper , the blister formation process of Mo/Si multilayers with a capping layer was investigated using a high-frequency hydrogen plasma system as a hydrogen ion source under varying hydrogen ion exposure conditions.Abstract:
Mo/Si multilayer mirrors are used for extreme ultraviolet (EUV) lithography. The formation of hydrogen-induced blisters in the Mo/Si multilayer is a problem that reduces the reflectance of the mirror. To evaluate the blister-resistance of EUV mirrors, the blister formation processes of Mo/Si multilayers with a capping layer were investigated using a high-frequency hydrogen plasma system as a hydrogen ion source under varying hydrogen ion exposure conditions. As a result, it was observed that blister formation by low-energy hydrogen ion irradiation of about 10 eV increases the blister-occupied area, depending on the amount of the ion dose. Furthermore, the sample was heated to promote the diffusion of hydrogen atoms, and the activation energy of blister formation was examined using the Arrhenius plot of the ion dose required for blister formation with respect to the heating temperature. The analysis showed that when the ion flux is known, the blister formation time can be predicted. read more
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In-situ non-destructive removal of tin particles by low-energy plasma for imitation of EUV optical mirrors self-cleaning
Sishu Wang,Zongbiao Ye,Guo-jiang Pu,Jianxing Liu,Li Yang,Wenna Jing,Mingming Yu,Fan Yang,Yichao Peng,Fujun Gou +9 more
TL;DR: In this paper , the feasibility of realizing in-situ and non-destructive self-cleaning of the multilayers mirror (MLM) by utilizing hydrogen plasma at low input power (<10 W) was explored.
EUV Debris Mitigation using Magnetic Nulls
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Surface-limited deuterium uptake of Ru films under plasma exposure
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References
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Plasma hydrogenation of strained Si∕SiGe∕Si heterostructure for layer transfer without ion implantation
Lin Shao,Y. Lin,Jung-Kun Lee,Q. X. Jia,Yongqiang Wang,Michael Nastasi,Phillip E. Thompson,N. David Theodore,Paul K. Chu,T. L. Alford,James W. Mayer,Peng Chen,S. S. Lau +12 more
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