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Field-effect transistor with perovskite oxide channel

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TLDR
In this article, a field effect transistor (FET) is described having a source, a drain, a channel formed between the source and the drain, and a gate electrode.
Abstract
A field-effect transistor (FET) is described having a source; a drain; a channel formed between the source and the drain; and a gate electrode. The channel is composed of a film layer of oxide having the perovskite structure comprised of: (1) at least one metal selected from the group consisting of the metal elements in Group IV through Group XI of the Periodic Table of Elements and Bi; and (2) at least one metal selected from the group consisting of alkali metals, alkaline earth metals and rare earth metals. The layer has a film thickness of not larger than 1000 Å and the electrical resistivity not less than 2 million centimeters. The channel of the oxide film layer is provided with a metal oxide insulator layer formed directly or through another metal oxide insulator layer and a gate electrode in electrical contact therewith. It is possible to make memories using this FET. In addition, it also becomes possible to reduce the size of devices using the FET of the invention.

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Citations
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References
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Solid multi-component membranes, electrochemical reactor components, electrochemical reactors and use of membranes, reactor components, and reactor for oxidation reactions

TL;DR: In this article, solid membranes comprising an intimate, gas-impervious, multi-phase mixture of an electronically conductive material and an oxygen ion-conductive material, and/or mixed metal oxide of a perovskite structure are described.
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Short-channel effects in SOI MOSFETs

TL;DR: In this article, a short-channel effect exclusive to thin-film silicon-on-insulator (SOI) MOSFETs, back-surface charge modulation, is described.
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Epitaxial cuprate superconductor/ferroelectric heterostructures.

TL;DR: Thin-film heterostructures of Bi4Ti3O12Bi2Sr2CuO6+x, have been grown on single crystals of SrTiO 3, LaAlO3, and MgAl2O4 by pulsed laser deposition and show the composition to be close to the nominal stoichiometry.
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Influence of electric fields on pinning in YBa2Cu3O7- delta films.

TL;DR: In this article, the authors provided experimental evidence that the pinning force and the critical current density of YBa{sub 2}Cu{sub 3}O{sub 7{minus delta}} films can be controlled by electric fields.
Journal ArticleDOI

Electric field effect in high Tc superconducting ultrathin YBa2Cu3O7−x films

TL;DR: In this paper, a multilayer high Tc superconducting field effect transistor-like structure was made from ultrathin YBa2Cu3O7−x films, which had a forward bias breakdown voltage of about 20 V, allowing an electric field induced change in the channel layer of 1.25×1013 carrier/cm2 per volt of the gate voltage.