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Journal ArticleDOI

GaAs tetrahedral quantum dot structures fabricated using selective area metalorganic chemical vapor deposition

Takashi Fukui, +3 more
- 06 May 1991 - 
- Vol. 58, Iss: 18, pp 2018-2020
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TLDR
In this article, a tetrahedral quantum dot (TQD) was proposed to make a zero-dimensional electron-hole system, where the TQDs are surrounded by crystallographic facets fabricated using selective area metalorganic chemical vapor deposition (MOCVD) on (111)B GaAs substrates.
Abstract
New GaAs quantum dot structures, called tetrahedral quantum dots (TQDs), are proposed to make a zero‐dimensional electron‐hole system. The TQDs are surrounded by crystallographic facets fabricated using selective area metalorganic chemical vapor deposition (MOCVD) on (111)B GaAs substrates. The calculated energy sublevel structures of zero‐dimensional electrons in a GaAs TQD show large quantum size effects, because electrons are confined three dimensionally. GaAs and AlGaAs tetrahedral facet structures on (111)B GaAs substrates partially etched into a triangular shape were grown using MOCVD. Tetrahedral growth with {110} facets occurs in the triangular areas. The cathodoluminescence intensity map for GaAs tetrahedrons buried in AlGaAs shows the tetrahedral dot array.

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Citations
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Chemistry and properties of nanocrystals of different shapes.

TL;DR: The interest in nanoscale materials stems from the fact that new properties are acquired at this length scale and, equally important, that these properties are equally important.
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Three- and low-dimensional inorganic semiconductors

TL;DR: In this article, the structural, optical and related properties of inorganic-organic hybrid systems with a semiconductor behavior are reviewed, especially for semiconductor particles, in which the inorganic part is inorganic.
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Catalyst-free growth of GaAs nanowires by selective-area metalorganic vapor-phase epitaxy

TL;DR: In this paper, the fabrication of GaAs hexagonal nanowires surrounded by vertical facets on a GaAs (111) B substrate using selective-area (SA) metalorganic vapor-phase epitaxial (MOVPE) growth was described.
Journal ArticleDOI

Growth of GaAs Epitaxial Microcrystals on an S-Terminated GaAs Substrate by Successive Irradiation of Ga and As Molecular Beams

TL;DR: In this article, the growth of GaAs microcrystals on the S-terminated substrate was caused by a vapor-liquid-solid (VLS) mechanism, and droplet epitaxy was used as a growth method for fabricating GaAs quantum well boxes.
Journal ArticleDOI

Catalyst-free selective-area MOVPE of semiconductor nanowires on (111)B oriented substrates

TL;DR: In this paper, a catalyst-free approach for the growth of semiconductor nanowires was proposed, which is attracting interest as building blocks for nanoscale electronics and circuits.
References
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Journal ArticleDOI

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Journal ArticleDOI

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Journal ArticleDOI

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TL;DR: In this article, the authors studied the OMCVD growth of GaAs/AlGaAs quantum well heterostructures on non-planar substrates in the temperature range of 625 to 750°C.
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